Microstructure and optical properties of layers formed by anodic etching of silicon
For various applications in optoelectronics and photovoltaics porous silicon structures are implemented for suppression of the spectral reflectance. We formed porous silicon structures by the anodic etching of p-type silicon substrates. Different etching conditions have been used in the forming proc...
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Published in | AIP conference proceedings Vol. 2131; no. 1 |
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Main Authors | , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Melville
American Institute of Physics
29.07.2019
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Subjects | |
Online Access | Get full text |
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