Electrical And OES Diagnostics Of A Magnetized RF Discharge In CH4 Created By A Multihole Cathode Used For a-C:H Deposition

• Published in: Laser and Plasma Applications in Materials Science (AIP Conference Proceedings Volume 1047) Vol. 1047; pp. 228 - 231
• Main Authors: Djerourou, S, Henda, K, Ouchabane, M
• Format: Journal Article
• Language: English
• Published: 01.01.2008

The present work is carried out in the context of the electrical and spectroscopic study of a reactor used for a-C:H deposition. We have studied the influence of the operation system parameters (incident power, pressure) on the self-bias voltage and on the saturation ion current density. The optical...