Electrical And OES Diagnostics Of A Magnetized RF Discharge In CH4 Created By A Multihole Cathode Used For a-C:H Deposition
The present work is carried out in the context of the electrical and spectroscopic study of a reactor used for a-C:H deposition. We have studied the influence of the operation system parameters (incident power, pressure) on the self-bias voltage and on the saturation ion current density. The optical...
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Published in | Laser and Plasma Applications in Materials Science (AIP Conference Proceedings Volume 1047) Vol. 1047; pp. 228 - 231 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
01.01.2008
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Online Access | Get full text |
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