Ultrathin zirconium silicate films deposited on Si(100) using Zr(Oi-Pr)2(thd)2, Si(Ot-Bu)2(thd)2, and nitric oxide

• Published in: Journal of the Electrochemical Society Vol. 150; no. 7; pp. C465 - C471
• Main Authors: Chen, H.-W., Huang, T.-Y., Landheer, D, Wu, X., Moisa, S, Sproule, G I, Kim, J K, Lennard, W N, Chao, T.-S.
• Format: Journal Article
• Language: English
• Published: 01.07.2003

Ultrathin Zr silicate films were deposited using Zr(O'-Pr)2(tetramethylheptanedione, thd)2, Si(Ot-Bu)2(thd)2 and nitric oxide in a pulse-mode metallorganic chemical-vapor deposition apparatus with a liquid injection source. High resolution transmission electron microscopy, atomic force microsco...