라만 분광법을 이용한 반도체 공정 중 표면 분석

• Published in: Biuletyn Uniejowski Vol. 57; no. 2; pp. 71 - 85
• Main Authors: 최태민(Tae Min Choi), 유진욱(JinUk Yoo), 정은수(Eun Su Jung), 이채연(Chae Yeon Lee), 이화림(Hwa Rim Lee), 김동현(Dong Hyun Kim), 표성규(Sung Gyu Pyo)
• Format: Journal Article
• Language: Korean
• Published: 한국표면공학회 2024
• Subjects: 기계공학; Raman Spectroscopy; Semiconductor Processing; In-situ monitoring; Surface analysis

This article provides an overview of Raman spectroscopy and its practical applications for surface analysis of semiconductor processes including real-time monitoring. Raman spectroscopy is a technique that uses the inelastic scattering of light to provide information on molecular structure and vibra...