라만 분광법을 이용한 반도체 공정 중 표면 분석

This article provides an overview of Raman spectroscopy and its practical applications for surface analysis of semiconductor processes including real-time monitoring. Raman spectroscopy is a technique that uses the inelastic scattering of light to provide information on molecular structure and vibra...

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Published inBiuletyn Uniejowski Vol. 57; no. 2; pp. 71 - 85
Main Authors 최태민(Tae Min Choi), 유진욱(JinUk Yoo), 정은수(Eun Su Jung), 이채연(Chae Yeon Lee), 이화림(Hwa Rim Lee), 김동현(Dong Hyun Kim), 표성규(Sung Gyu Pyo)
Format Journal Article
LanguageKorean
Published 한국표면공학회 2024
Subjects
기계공학
Raman Spectroscopy
Semiconductor Processing
In-situ monitoring
Surface analysis
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Summary:This article provides an overview of Raman spectroscopy and its practical applications for surface analysis of semiconductor processes including real-time monitoring. Raman spectroscopy is a technique that uses the inelastic scattering of light to provide information on molecular structure and vibrations. Since its inception in 1928, Raman spectroscopy has undergone continuous development, and with the advent of SERS(Surface Enhanced Raman Spectroscopy), TERS(Tip Enhanced Raman Spectroscopy), and confocal Raman spectroscopy, it has proven to be highly advantageous in nano-scale analysis due to its high resolution, high sensitivity, and non-destructive nature. In the field of semiconductor processing, Raman spectroscopy is particularly useful for substrate stress and interface characterization, quality analysis of thin films, elucidation of etching process mechanisms, and detection of residues.
Bibliography:KISTI1.1003/JNL.JAKO202414862988162
ISSN:1225-8024
2299-8403
2288-8403
DOI:10.5695/JSSE.2024.57.2.71