전자빔 증발원을 이용한 물질의 증발 특성

• Published in: Biuletyn Uniejowski Vol. 44; no. 4; pp. 155 - 164
• Main Authors: 정재인(J. I. Jeong), 양지훈(J.H. Yang), 박혜선(H.S. Park), 정재훈(J.H. Jung), 송민아(M.A. Song)
• Format: Journal Article
• Language: Korean
• Published: 한국표면공학회 2011
• Subjects: 기계공학; Thin films; Physical vapor deposition; Evaporation characteristics; Electron beam evaporation source; Crucible and crucible liner

Electron beam evaporation source is widely used to prepare thin films by physical vapor deposition because it is very effective to vaporize materials and there is virtually no limit to vaporize materials including metals and compounds such as oxide. In this study, evaporation characteristics of vari...