Electromigration에 의한 Sn-0.7Cu 솔더 금속간화합물 성장 예측

The reliability of printed circuit boards (PCB) has emerged as a critical concern as the size of solder bump decreases and current density to solder bump increases by fine pitch formation. The main failure mode of solder bumps is open-circuits due to void formation as intermetallic compounds (IMC) g...

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Published in대한금속·재료학회지, 54(12) Vol. 54; no. 12; pp. 908 - 915
Main Authors 허민혁, Min-hyeok Heo, 강남현, Namhyun Kang, 박성훈, Seonghun Park, 김준기, Jun-ki Kim, 홍원식, Won Sik Hong
Format Journal Article
LanguageKorean
Published 대한금속재료학회 05.12.2016
대한금속·재료학회
Subjects
Online AccessGet full text
ISSN1738-8228
2288-8241
DOI10.3365/KJMM.2016.54.12.908

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Abstract The reliability of printed circuit boards (PCB) has emerged as a critical concern as the size of solder bump decreases and current density to solder bump increases by fine pitch formation. The main failure mode of solder bumps is open-circuits due to void formation as intermetallic compounds (IMC) grow, mainly due to electromigration. This study modeled IMC growth by electromigration in Sn-0.7Cu solder bumps. The IMC produced in the reflow process grew again significantly due to electromigration upon application of electric current. The thickness of the IMC under electromigration increased as the current increased from 1 A (current density: 1.3 × 104 A/cm2) to 1.5 A (current density: 1.9 × 104 A/cm2). For the current density applied in the study, IMC growth of Cu6Sn5 was faster than that of Cu3Sn. The Nernst-Einstein relation was used to model the IMC growth induced by electromigration. The modeling results of Cu3Sn and Cu6Sn5 thickness showed good agreement with the experimental observations of IMC growth under electromigration. Specifically, a good prediction for Cu3Sn growth was derived for the current density of 1.3 × 104 A/cm2. However, the modeling values of 1.9 × 104 A/cm2 and Cu6Sn5 thickness showed a minor difference as compared with the experimental IMC thickness results. As the current density increased from 1.3 × 104 A/cm2 to 1.9 × 104 A/cm2, the solder bump probably evolved under heat generation, and the further effects of aging and thermomigration should be incorporated in the IMC growth. †(Received April 7, 2016; Accepted June 17, 2016)
AbstractList The reliability of printed circuit boards (PCB) has emerged as a critical concern as the size of solder bump decreases and current density to solder bump increases by fine pitch formation. The main failure mode of solder bumps is open-circuits due to void formation as intermetallic compounds (IMC) grow, mainly due to electromigration. This study modeled IMC growth by electromigration in Sn-0.7Cu solder bumps. The IMC produced in the reflow process grew again significantly due to electromigration upon application of electric current. The thickness of the IMC under electromigration increased as the current increased from 1 A (current density: 1.3 × 104 A/cm2) to 1.5 A (current density: 1.9 × 104 A/cm2). For the current density applied in the study, IMC growth of Cu6Sn5 was faster than that of Cu3Sn. The Nernst-Einstein relation was used to model the IMC growth induced by electromigration. The modeling results of Cu3Sn and Cu6Sn5 thickness showed good agreement with the experimental observations of IMC growth under electromigration. Specifically, a good prediction for Cu3Sn growth was derived for the current density of 1.3 × 104 A/cm2. However, the modeling values of 1.9 × 104 A/cm2 and Cu6Sn5 thickness showed a minor difference as compared with the experimental IMC thickness results. As the current density increased from 1.3 × 104 A/cm2 to 1.9 × 104 A/cm2, the solder bump probably evolved under heat generation, and the further effects of aging and thermomigration should be incorporated in the IMC growth. KCI Citation Count: 6
The reliability of printed circuit boards (PCB) has emerged as a critical concern as the size of solder bump decreases and current density to solder bump increases by fine pitch formation. The main failure mode of solder bumps is open-circuits due to void formation as intermetallic compounds (IMC) grow, mainly due to electromigration. This study modeled IMC growth by electromigration in Sn-0.7Cu solder bumps. The IMC produced in the reflow process grew again significantly due to electromigration upon application of electric current. The thickness of the IMC under electromigration increased as the current increased from 1 A (current density: 1.3 × 104 A/cm2) to 1.5 A (current density: 1.9 × 104 A/cm2). For the current density applied in the study, IMC growth of Cu6Sn5 was faster than that of Cu3Sn. The Nernst-Einstein relation was used to model the IMC growth induced by electromigration. The modeling results of Cu3Sn and Cu6Sn5 thickness showed good agreement with the experimental observations of IMC growth under electromigration. Specifically, a good prediction for Cu3Sn growth was derived for the current density of 1.3 × 104 A/cm2. However, the modeling values of 1.9 × 104 A/cm2 and Cu6Sn5 thickness showed a minor difference as compared with the experimental IMC thickness results. As the current density increased from 1.3 × 104 A/cm2 to 1.9 × 104 A/cm2, the solder bump probably evolved under heat generation, and the further effects of aging and thermomigration should be incorporated in the IMC growth. †(Received April 7, 2016; Accepted June 17, 2016)
Author Won Sik Hong
Min-hyeok Heo
Namhyun Kang
박성훈
허민혁
김준기
홍원식
Seonghun Park
강남현
Jun-ki Kim
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DocumentTitleAlternate Electromigration에 의한 Sn-0.7Cu 솔더 금속간화합물 성장 예측
Kinetics of Intermetallic Compounds Growth Induced by Electromigration of Sn-0.7Cu Solder
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Snippet The reliability of printed circuit boards (PCB) has emerged as a critical concern as the size of solder bump decreases and current density to solder bump...
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SubjectTerms current density
electromigration
intermetallic compounds
modeling
Sn-0.7Cu solder
재료공학
Title Electromigration에 의한 Sn-0.7Cu 솔더 금속간화합물 성장 예측
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