3가크롬 도금욕에서 펄스도금조건이 전류효율에 미치는 영향

• Published in: Biuletyn Uniejowski Vol. 36; no. 2; pp. 161 - 167
• Main Authors: 황경진(Kyoung-Jin Hwang), 안종관(Jong-Gwan Ahn), 이만승(Man-Seung Lee), 오영주(Young-Joo Oh)
• Format: Journal Article
• Language: Korean
• Published: 한국표면공학회 2003
• Subjects: 기계공학; Electroplating; Pulsed current; Trivalent chromium

In order to investigate the effects of pulse plating conditions on the electrodeposition of trivalent chromium, electroplating experiments from bath with low concentration of trivalent chromium were performed. The variation of current efficiency of chromium electroplating with the electroplating con...