On the Origin of the Large Remanent Polarization in La:HfO2

• Published in: Advanced electronic materials Vol. 5; no. 12
• Main Authors: Schenk, Tony, Fancher, Chris M., Park, Min Hyuk, Richter, Claudia, Künneth, Christopher, Kersch, Alfred, Jones, Jacob L., Mikolajick, Thomas, Schroeder, Uwe
• Format: Journal Article
• Language: English
• Published: United States Wiley 01.12.2019
• Subjects: ferroelectrics; HfO2; MATERIALS SCIENCE; stress; texture; XRD

The outstanding remanent polarization of 40 µC cm–2 reported for a 10 nm thin La:HfO2 film in 2013 has attracted much attention. However, up to now, no explanation for this large remanent polarization has been presented. Density functional theory and X‐ray diffraction are used to shine light onto th...