On the Origin of the Large Remanent Polarization in La:HfO2 - Schenk, Tony; Fancher, Chris M.; Park, Min Hyuk; Richter, Claudia; Künneth, Christopher; Kersch, Alfred; Jones, Jacob L.; Mikolajick, Thomas; Schroeder, Uwe (Advanced electronic materials, 2019)
Keywords: ferroelectrics; HfO2; MATERIALS SCIENCE; stress; texture; XRD