APA (7th ed.) Citation

Schenk, T., Fancher, C. M., Park, M. H., Richter, C., Künneth, C., Kersch, A., . . . Schroeder, U. (2019). On the Origin of the Large Remanent Polarization in La: HfO2. Advanced electronic materials, 5(12), -n/a. https://doi.org/10.1002/aelm.201900303

Chicago Style (17th ed.) Citation

Schenk, Tony, Chris M. Fancher, Min Hyuk Park, Claudia Richter, Christopher Künneth, Alfred Kersch, Jacob L. Jones, Thomas Mikolajick, and Uwe Schroeder. "On the Origin of the Large Remanent Polarization in La: HfO2." Advanced Electronic Materials 5, no. 12 (2019): -n/a. https://doi.org/10.1002/aelm.201900303.

MLA (9th ed.) Citation

Schenk, Tony, et al. "On the Origin of the Large Remanent Polarization in La: HfO2." Advanced Electronic Materials, vol. 5, no. 12, 2019, pp. -n/a, https://doi.org/10.1002/aelm.201900303.