Progress in EUV lithography toward manufacturing

• Main Authors: Kim, Seong-Sue, Chalykh, Roman, Kim, Hoyeon, Lee, Seungkoo, Park, Changmin, Hwang, Myungsoo, Park, Joo-On, Park, Jinhong, Kim, Hocheol, Jeon, Jinho, Kim, Insung, Lee, Donggun, Na, Jihoon, Kim, Jungyeop, Lee, Siyong, Kim, Hyunwoo, Nam, Seok-Woo
• Format: Conference Proceeding
• Language: English
• Published: SPIE 01.01.2017

In this article the recent progress in the elements of EUV lithography is presented. Source power around 205W was demonstrated and further scaling up is going on, which is expected to be implemented in the field within 2017. Source availability keeps improving especially due to the introduction of n...