Effect of Annealing Ferroelectric HfO2 Thin Films: In Situ, High Temperature X‐Ray Diffraction - Park, Min Hyuk; Chung, Ching‐Chang; Schenk, Tony; Richter, Claudia; Opsomer, Karl; Detavernier, Christophe; Adelmann, Christoph; Jones, Jacob L.; Mikolajick, Thomas; Schroeder, Uwe (Advanced electronic materials, 2018)
Keywords: ferroelectricity; fluorite structure; hafnia; phase transitions; X‐ray diffraction