シリコン単結晶の重回帰分析を用いたX線応力測定
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| Published in | 日本機械学会論文集 A編 Vol. 72; no. 717; pp. 765 - 771 |
|---|---|
| Main Authors | , , , |
| Format | Journal Article |
| Language | Japanese |
| Published |
一般社団法人 日本機械学会
01.05.2006
|
| Online Access | Get full text |
| ISSN | 0387-5008 1884-8338 |
| DOI | 10.1299/kikaia.72.765 |
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| Author | 町屋, 修太郎 田中, 啓介 秋庭, 義明 水野, 賢一 |
|---|---|
| Author_xml | – sequence: 1 fullname: 田中, 啓介 organization: 名古屋大学大学院工学研究科 – sequence: 1 fullname: 町屋, 修太郎 organization: 名古屋大学大学院工学研究科 – sequence: 1 fullname: 水野, 賢一 organization: ブラザー工業 (株) [元 : 名古屋大学大学院] – sequence: 1 fullname: 秋庭, 義明 organization: 名古屋大学大学院工学研究科 |
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| References | (5) Suzuki, H., Akita, K., Misawa, H., X-ray Stress Measurement Method for Single Crystal with Unknown Stress-Free Lattice Parameter, Japanese Journal of Applied Physics., 42 (2003) 2876-2880. (3) Tanaka, K., Akiniwa, Y., Mizuno, K., Shirakihara, K., A Method of X-Ray Stress Measurement of Silicon Single Crystal (in Japanese), Journal of the Society of Materials Science Japan, Vol. 52, No. 10 (2003) pp. 1237-1244. (8) Hanabusa, T., Fujiwara, H., Influence of Texture in Orthogonally-Planed Surface Layer on X-Ray Lattice Strains, Journal of the Society of Materials Science Japan, Vol. 33, No. 367 (19843) pp. 372-377. (4) Saito, Y., Kurita, M., Sawaguchi, Y., X-Ray Residual Stress Measurement of Silicon Single Crystal (in Japanese), Transactions of the Society of Mechanical Engineers, Series A, Vol. 69, No. 686 (2003) pp. 1482-1489. (2) Suyama, Y., Ohya, S., Yoshioka, Y., X-Ray Measurement of Stresses in a Crystal Grain by Position Sensitive Detector (in Japanese), Journal of the Society of Materials Science Japan, Vol. 48, No. 12 (2003) pp. 1437-1442. (6) Suzuki, H., Akita, K., Yoshioka, Y., Misawa, K., X-Ray Stress Measurements of Single Crystal in Local Area Using Synchrotron Radiation (in Japanese), Journal of the Society of Materials Science Japan, Vol. 50, No. 7 (2001) pp. 783-789. (9) H.J. McSkimin and J. P. Andreatch, Jr., Elastic Moduli of Silicon vs Hydrostatic Pressure at 25°C and -195.8°C, Journal of Applied Physics, Vol.35 (1964) pp.2161-2165 (1) Konaga, T., Honda. K, Local Stress Measurements by Crystal Oscillation Microbeam and Several Applications (in Japanese), Journal of the Japanese Society of Mechanical Engineers, Vo. 73, No. 618 (1970) pp. 972-979. (7) Suzuki, H., Akita, K., Yoshioka, Y., Waku, Y., Misawa, H., Evaluation of Phase Stresses of Al2O3/YAG Binary MGC by Synchrotron Radiation-Residual Stress State and Stress Behavior of YAG Phase-(in Japanese), Journal of the Society of Materials Science Japan, Vol. 52, No. 7 (2003) pp. 770-775. |
| References_xml | – reference: (4) Saito, Y., Kurita, M., Sawaguchi, Y., X-Ray Residual Stress Measurement of Silicon Single Crystal (in Japanese), Transactions of the Society of Mechanical Engineers, Series A, Vol. 69, No. 686 (2003) pp. 1482-1489. – reference: (1) Konaga, T., Honda. K, Local Stress Measurements by Crystal Oscillation Microbeam and Several Applications (in Japanese), Journal of the Japanese Society of Mechanical Engineers, Vo. 73, No. 618 (1970) pp. 972-979. – reference: (5) Suzuki, H., Akita, K., Misawa, H., X-ray Stress Measurement Method for Single Crystal with Unknown Stress-Free Lattice Parameter, Japanese Journal of Applied Physics., 42 (2003) 2876-2880. – reference: (6) Suzuki, H., Akita, K., Yoshioka, Y., Misawa, K., X-Ray Stress Measurements of Single Crystal in Local Area Using Synchrotron Radiation (in Japanese), Journal of the Society of Materials Science Japan, Vol. 50, No. 7 (2001) pp. 783-789. – reference: (3) Tanaka, K., Akiniwa, Y., Mizuno, K., Shirakihara, K., A Method of X-Ray Stress Measurement of Silicon Single Crystal (in Japanese), Journal of the Society of Materials Science Japan, Vol. 52, No. 10 (2003) pp. 1237-1244. – reference: (8) Hanabusa, T., Fujiwara, H., Influence of Texture in Orthogonally-Planed Surface Layer on X-Ray Lattice Strains, Journal of the Society of Materials Science Japan, Vol. 33, No. 367 (19843) pp. 372-377. – reference: (2) Suyama, Y., Ohya, S., Yoshioka, Y., X-Ray Measurement of Stresses in a Crystal Grain by Position Sensitive Detector (in Japanese), Journal of the Society of Materials Science Japan, Vol. 48, No. 12 (2003) pp. 1437-1442. – reference: (7) Suzuki, H., Akita, K., Yoshioka, Y., Waku, Y., Misawa, H., Evaluation of Phase Stresses of Al2O3/YAG Binary MGC by Synchrotron Radiation-Residual Stress State and Stress Behavior of YAG Phase-(in Japanese), Journal of the Society of Materials Science Japan, Vol. 52, No. 7 (2003) pp. 770-775. – reference: (9) H.J. McSkimin and J. P. Andreatch, Jr., Elastic Moduli of Silicon vs Hydrostatic Pressure at 25°C and -195.8°C, Journal of Applied Physics, Vol.35 (1964) pp.2161-2165 |
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| Title | シリコン単結晶の重回帰分析を用いたX線応力測定 |
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