Studies on Sensitive Materials for Lithography-Platemaking (Part 1)

With respect to benzoquinone-(1, 2)-diazide (2) compounds, benzoquinone-(1, 4)diazide-(4) compounds and iminoquinone-(1, 4)-diazide compounds which are used for sensitizing solution for pre-sensitized plate, there are several examples in the patents of Kalle Co. in West Germany. 1. In consideration...

Full description

Saved in:
Bibliographic Details
Published inBulletin of the Technical Association of Graphic Arts of Japan Vol. 8; no. 20; pp. 17 - 25
Main Authors Hanaoka, Akira, Muramoto, Yoshihiro, Yamada, Masatsugu, Kawada, Masaki
Format Journal Article
LanguageEnglish
Japanese
Published The Japanese Society of Printing Science and Technology 01.04.1965
Online AccessGet full text

Cover

Loading…
Abstract With respect to benzoquinone-(1, 2)-diazide (2) compounds, benzoquinone-(1, 4)diazide-(4) compounds and iminoquinone-(1, 4)-diazide compounds which are used for sensitizing solution for pre-sensitized plate, there are several examples in the patents of Kalle Co. in West Germany. 1. In consideration of the above patents, we have obtained benzoquinone-(1, 2)-diazide-(2)-4-(N, N-diphenyl)-sulfoanilide through the five processes of o-chloronitrobenzene and p-phenylenediamine and, also compounded eight kinds of relative compounds. Next, these diazo compunds were solved in methylcellosolve or dioxane, then coated on grained Al plates and dried, After finishing exposure, inking and developing these plates, we have got positive image from negative film, in which five kinds were of good result. 2. Continued from the above compounds, benzoquinone-(1, 4)-diazide-(4) compounds were synthesized and made experiments for the purpose of lithographic platemaking. We have compounded Benzoquinone-(1, 4)-diazide-(4)-5'-methyl-2-sulfoanilide from p-chloronitrobenzene and o-toluidine through eight processes, and also six kinds of relative compounds. Consequently, we have got good result in four kinds. 3. Next, Iminoquinone-(1, 4)-diazide-(4) compounds were synthesized. We have compounded N-(benzene-1'-sulfonyl)-imino-(1)-2-chlorobenzoquinone-(1, 4)-diazide-(4) from benzenesulfonylchloride and o-chloroaniline through four processes, and also fourteen kinds of relative compounds. consequently, we have obtained good result in six kinds. These diazo compounds are type of negaive to positive and could be well preserved, under the very condition of coating on Al plate, in cool and dark place for about one year.
AbstractList With respect to benzoquinone-(1, 2)-diazide (2) compounds, benzoquinone-(1, 4)diazide-(4) compounds and iminoquinone-(1, 4)-diazide compounds which are used for sensitizing solution for pre-sensitized plate, there are several examples in the patents of Kalle Co. in West Germany. 1. In consideration of the above patents, we have obtained benzoquinone-(1, 2)-diazide-(2)-4-(N, N-diphenyl)-sulfoanilide through the five processes of o-chloronitrobenzene and p-phenylenediamine and, also compounded eight kinds of relative compounds. Next, these diazo compunds were solved in methylcellosolve or dioxane, then coated on grained Al plates and dried, After finishing exposure, inking and developing these plates, we have got positive image from negative film, in which five kinds were of good result. 2. Continued from the above compounds, benzoquinone-(1, 4)-diazide-(4) compounds were synthesized and made experiments for the purpose of lithographic platemaking. We have compounded Benzoquinone-(1, 4)-diazide-(4)-5'-methyl-2-sulfoanilide from p-chloronitrobenzene and o-toluidine through eight processes, and also six kinds of relative compounds. Consequently, we have got good result in four kinds. 3. Next, Iminoquinone-(1, 4)-diazide-(4) compounds were synthesized. We have compounded N-(benzene-1'-sulfonyl)-imino-(1)-2-chlorobenzoquinone-(1, 4)-diazide-(4) from benzenesulfonylchloride and o-chloroaniline through four processes, and also fourteen kinds of relative compounds. consequently, we have obtained good result in six kinds. These diazo compounds are type of negaive to positive and could be well preserved, under the very condition of coating on Al plate, in cool and dark place for about one year.
Author Yamada, Masatsugu
Hanaoka, Akira
Muramoto, Yoshihiro
Kawada, Masaki
Author_xml – sequence: 1
  fullname: Hanaoka, Akira
  organization: Chemical Research Laboratory, Koyosha Co., Ltd
– sequence: 2
  fullname: Muramoto, Yoshihiro
  organization: Faculty of Science & Engineering, Kinki University Osaka
– sequence: 3
  fullname: Yamada, Masatsugu
  organization: Chemical Research Laboratory, Koyosha Co., Ltd
– sequence: 4
  fullname: Kawada, Masaki
  organization: Chemical Research Laboratory, Koyosha Co., Ltd
BookMark eNo9kM1Lw0AUxBepYK09et-jHhL37UfyctRiVahYqJ7DZvOSbm03ZROF_vcWWrzMHH7DMMw1G4UuEGO3IFIADeoh-BYKgymmkF-wsQQ0CchMjdhYCC0Sgbm-YtO-3wghQKAxqMZsthp-ak897wJfUej94H-Jv9uBorfbnjdd5As_rLs22v36kCy3R7Sz3z60_G5p48Dh_oZdNscsTc8-YV_z58_Za7L4eHmbPS6SDUAWEkWmqDNQSBk4KqxFAw4FOaywLipF2jVKZ8ZUSpLEQtda5U0mpKHCoZRqwp5OvZt-sC2V--h3Nh7K4wrvtlSeHyixlOIkkP9Dt7axpKD-AC7MWW4
ContentType Journal Article
Copyright The Japanese Society of Printing Science and Technology
Copyright_xml – notice: The Japanese Society of Printing Science and Technology
DOI 10.11413/nig1958.8.17
DatabaseTitleList
DeliveryMethod fulltext_linktorsrc
Discipline Education
EISSN 2185-1263
EndPage 25
ExternalDocumentID article_nig1958_8_20_8_20_17_article_char_en
GroupedDBID ALMA_UNASSIGNED_HOLDINGS
JSF
KQ8
RJT
ID FETCH-LOGICAL-j116n-3e59d6138e61ce9aa851c80ec8b8d9b3e4cf34655b32e2894d437f6025e9c8223
ISSN 0040-0874
IngestDate Wed Apr 05 03:02:41 EDT 2023
IsDoiOpenAccess true
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Issue 20
Language English
Japanese
LinkModel OpenURL
MergedId FETCHMERGED-LOGICAL-j116n-3e59d6138e61ce9aa851c80ec8b8d9b3e4cf34655b32e2894d437f6025e9c8223
OpenAccessLink https://www.jstage.jst.go.jp/article/nig1958/8/20/8_20_17/_article/-char/en
PageCount 9
ParticipantIDs jstage_primary_article_nig1958_8_20_8_20_17_article_char_en
PublicationCentury 1900
PublicationDate 1965/04/01
PublicationDateYYYYMMDD 1965-04-01
PublicationDate_xml – month: 04
  year: 1965
  text: 1965/04/01
  day: 01
PublicationDecade 1960
PublicationTitle Bulletin of the Technical Association of Graphic Arts of Japan
PublicationTitleAlternate Bulletin of the Technical Association of Graphic Arts of Japan
PublicationYear 1965
Publisher The Japanese Society of Printing Science and Technology
Publisher_xml – name: The Japanese Society of Printing Science and Technology
References 6) Y. ムンダーなど: 日特公, 昭38-18, 313
12) T. Kunitake; C. C. Prce; J. Am. Chem. Soc. 85, 761 (1963
12) L. Horner; W. Naumann: Ann. 587, 93 (1954
4) M. P. Schmidt; O. Süs: U. S. P. 2, 907, 655 (1959
10) B. Cohn: U.S. P. 2, 882, 153 (1959
11) O. Süs; K. Möller: Ann. 599, 223 (1956
9) G. R. Hodgins: U.S. P. 2, 826, 501 (1958
5) M. P. Schmidt; O. Süs: U.S. P. 2, 754, 209 (1956
7) A. Murray: U.S. P. 2, 756, 143 (1956
1) W. Neugebauer; O. Süs: D. P. 901, 129 (1954
13) O. Süs; H. Müller; H. Heiss: Ann. 598, 123 (1956
4) O. Süs; K. Möller: 日特公, 昭37-1954
6) W. Neugebauer etc.: D. P. 1, 075, 950 (1960
11) O. Süs; K. Möller: Ann. 593, 91 (1955
8) L. Plambeck Jr.: U.S. P. 2, 791, 504 (1957
3) O. Süs: D. P. 936, 371 (1955
2) W. Neugebauer; M. Tomanek: D. P. 903, 529 (1954
4) W. Neugebauer: D. P. 1, 058, 845 (1958
5) W. Neugebauer; O. Süs: D. P. 1, 053, 930 (1959
12) J. K. Stillc; P. Cassidy; L. Plummer; J. Am. Chem. Soc. 83, 1318 (1963
4) O. Süs: D. P. 888, 204 (1953
5) W. ノイゲバウエル; O. ジイス; H. L. シュッムプ: 日特公, 昭35-16, 157
6) M. P. Schmidt; O. Süs: U.S. P. 2, 759, 817 (1956
References_xml
SSID ssj0001085583
Score 1.1629462
Snippet With respect to benzoquinone-(1, 2)-diazide (2) compounds, benzoquinone-(1, 4)diazide-(4) compounds and iminoquinone-(1, 4)-diazide compounds which are used...
SourceID jstage
SourceType Publisher
StartPage 17
Title Studies on Sensitive Materials for Lithography-Platemaking (Part 1)
URI https://www.jstage.jst.go.jp/article/nig1958/8/20/8_20_17/_article/-char/en
Volume 8
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
ispartofPNX Bulletin of the Technical Association of Graphic Arts of Japan, 1965/04/01, Vol.8(20), pp.17-25
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwpV1Lb9QwELaWcuGCykvQAvKBA6jKsk68iSNOqAKqQlGRWqmcIr_STRcStMkKiR_Lb2HGdrKhgEThYkX2xnF2JuPx-JvPhDwxmZKz1PFUMhvx3LBIKVislKnRQiuhpSPTOXqfHpzyw7P52WTyfYRaWndqqr_9Nq_kX6QKdSBXzJK9gmSHTqECrkG-UIKEofwrGQcQ4J775uvWw4COZOef7RCE76puEVipo-NPElmblyE6cAw97rE-FNBv7AY67h474ELvlwWJjW-wz0pjdN-hQQ5h1q039qyWzdKHbJfVSo7EKkE3XHj2Y9MuqkW1agbDIz9LI30CUSu7dn2-HqYD-XXUtKw2sQqkKhxBXIZsNxyNbe2ASkWo36ryx2L09gz3DC5tLQT7jWBU4c_1mVpXBz7KPGJxMJPBpouR6sazkYH2iaJhqvcp179OIjCxIyttdY5MPFMx7W_6iZc7SL0IPytEEc98wbKib8TUOdDUa-R6DIYQIYdvP4hNDBBBgmIAduKL9TSwMITn4wGAg3QBy4Ueaui8n5NtcjMsW-hL_8BbZGLr23jid0AH3SH7QRdpU9NBF-mgixR0kf5BF-lT1ETKnt0lp69fnewfROGAjuiCsbSOEjvPDfiDwqZM21xKcN-1mFktlDC5SizXZYIEfSqJLazsueFJVqbgZttcg2ea3CNbdVPb-4RyY6U0VmeqNDzjVsZKqLksOStxTcEekBf-_YsvnoWluMr_v_Nfd--SGxtlfki2utXaPgJXtFOPnTx_AB48knk
link.rule.ids 315,783,787,27938,27939
linkProvider Colorado Alliance of Research Libraries
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Studies+on+Sensitive+Materials+for+Lithography-Platemaking+%28Part+1%29&rft.jtitle=Bulletin+of+the+Technical+Association+of+Graphic+Arts+of+Japan&rft.au=Hanaoka%2C+Akira&rft.au=Muramoto%2C+Yoshihiro&rft.au=Yamada%2C+Masatsugu&rft.au=Kawada%2C+Masaki&rft.date=1965-04-01&rft.pub=The+Japanese+Society+of+Printing+Science+and+Technology&rft.issn=0040-0874&rft.eissn=2185-1263&rft.volume=8&rft.issue=20&rft.spage=17&rft.epage=25&rft_id=info:doi/10.11413%2Fnig1958.8.17&rft.externalDocID=article_nig1958_8_20_8_20_17_article_char_en
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0040-0874&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0040-0874&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0040-0874&client=summon