Studies on Sensitive Materials for Lithography-Platemaking (Part 1)
With respect to benzoquinone-(1, 2)-diazide (2) compounds, benzoquinone-(1, 4)diazide-(4) compounds and iminoquinone-(1, 4)-diazide compounds which are used for sensitizing solution for pre-sensitized plate, there are several examples in the patents of Kalle Co. in West Germany. 1. In consideration...
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Published in | Bulletin of the Technical Association of Graphic Arts of Japan Vol. 8; no. 20; pp. 17 - 25 |
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Main Authors | , , , |
Format | Journal Article |
Language | English Japanese |
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The Japanese Society of Printing Science and Technology
01.04.1965
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Abstract | With respect to benzoquinone-(1, 2)-diazide (2) compounds, benzoquinone-(1, 4)diazide-(4) compounds and iminoquinone-(1, 4)-diazide compounds which are used for sensitizing solution for pre-sensitized plate, there are several examples in the patents of Kalle Co. in West Germany. 1. In consideration of the above patents, we have obtained benzoquinone-(1, 2)-diazide-(2)-4-(N, N-diphenyl)-sulfoanilide through the five processes of o-chloronitrobenzene and p-phenylenediamine and, also compounded eight kinds of relative compounds. Next, these diazo compunds were solved in methylcellosolve or dioxane, then coated on grained Al plates and dried, After finishing exposure, inking and developing these plates, we have got positive image from negative film, in which five kinds were of good result. 2. Continued from the above compounds, benzoquinone-(1, 4)-diazide-(4) compounds were synthesized and made experiments for the purpose of lithographic platemaking. We have compounded Benzoquinone-(1, 4)-diazide-(4)-5'-methyl-2-sulfoanilide from p-chloronitrobenzene and o-toluidine through eight processes, and also six kinds of relative compounds. Consequently, we have got good result in four kinds. 3. Next, Iminoquinone-(1, 4)-diazide-(4) compounds were synthesized. We have compounded N-(benzene-1'-sulfonyl)-imino-(1)-2-chlorobenzoquinone-(1, 4)-diazide-(4) from benzenesulfonylchloride and o-chloroaniline through four processes, and also fourteen kinds of relative compounds. consequently, we have obtained good result in six kinds. These diazo compounds are type of negaive to positive and could be well preserved, under the very condition of coating on Al plate, in cool and dark place for about one year. |
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AbstractList | With respect to benzoquinone-(1, 2)-diazide (2) compounds, benzoquinone-(1, 4)diazide-(4) compounds and iminoquinone-(1, 4)-diazide compounds which are used for sensitizing solution for pre-sensitized plate, there are several examples in the patents of Kalle Co. in West Germany. 1. In consideration of the above patents, we have obtained benzoquinone-(1, 2)-diazide-(2)-4-(N, N-diphenyl)-sulfoanilide through the five processes of o-chloronitrobenzene and p-phenylenediamine and, also compounded eight kinds of relative compounds. Next, these diazo compunds were solved in methylcellosolve or dioxane, then coated on grained Al plates and dried, After finishing exposure, inking and developing these plates, we have got positive image from negative film, in which five kinds were of good result. 2. Continued from the above compounds, benzoquinone-(1, 4)-diazide-(4) compounds were synthesized and made experiments for the purpose of lithographic platemaking. We have compounded Benzoquinone-(1, 4)-diazide-(4)-5'-methyl-2-sulfoanilide from p-chloronitrobenzene and o-toluidine through eight processes, and also six kinds of relative compounds. Consequently, we have got good result in four kinds. 3. Next, Iminoquinone-(1, 4)-diazide-(4) compounds were synthesized. We have compounded N-(benzene-1'-sulfonyl)-imino-(1)-2-chlorobenzoquinone-(1, 4)-diazide-(4) from benzenesulfonylchloride and o-chloroaniline through four processes, and also fourteen kinds of relative compounds. consequently, we have obtained good result in six kinds. These diazo compounds are type of negaive to positive and could be well preserved, under the very condition of coating on Al plate, in cool and dark place for about one year. |
Author | Yamada, Masatsugu Hanaoka, Akira Muramoto, Yoshihiro Kawada, Masaki |
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References | 6) Y. ムンダーなど: 日特公, 昭38-18, 313 12) T. Kunitake; C. C. Prce; J. Am. Chem. Soc. 85, 761 (1963 12) L. Horner; W. Naumann: Ann. 587, 93 (1954 4) M. P. Schmidt; O. Süs: U. S. P. 2, 907, 655 (1959 10) B. Cohn: U.S. P. 2, 882, 153 (1959 11) O. Süs; K. Möller: Ann. 599, 223 (1956 9) G. R. Hodgins: U.S. P. 2, 826, 501 (1958 5) M. P. Schmidt; O. Süs: U.S. P. 2, 754, 209 (1956 7) A. Murray: U.S. P. 2, 756, 143 (1956 1) W. Neugebauer; O. Süs: D. P. 901, 129 (1954 13) O. Süs; H. Müller; H. Heiss: Ann. 598, 123 (1956 4) O. Süs; K. Möller: 日特公, 昭37-1954 6) W. Neugebauer etc.: D. P. 1, 075, 950 (1960 11) O. Süs; K. Möller: Ann. 593, 91 (1955 8) L. Plambeck Jr.: U.S. P. 2, 791, 504 (1957 3) O. Süs: D. P. 936, 371 (1955 2) W. Neugebauer; M. Tomanek: D. P. 903, 529 (1954 4) W. Neugebauer: D. P. 1, 058, 845 (1958 5) W. Neugebauer; O. Süs: D. P. 1, 053, 930 (1959 12) J. K. Stillc; P. Cassidy; L. Plummer; J. Am. Chem. Soc. 83, 1318 (1963 4) O. Süs: D. P. 888, 204 (1953 5) W. ノイゲバウエル; O. ジイス; H. L. シュッムプ: 日特公, 昭35-16, 157 6) M. P. Schmidt; O. Süs: U.S. P. 2, 759, 817 (1956 |
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Title | Studies on Sensitive Materials for Lithography-Platemaking (Part 1) |
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