A Statistical Approach to Analyze the Impact of Random Discrete Dopant (RDD) and Oxide Thickness Variation (OTV) on the Performance of a Low Power Folded Cascode OTA

• Published in: Devices for Integrated Circuit pp. 343 - 347
• Main Authors: Dutta, Tanusree, Sarkhel, Saheli, Banerjee, Soham, Pandit, Soumya
• Format: Conference Proceeding
• Language: English
• Published: IEEE 05.04.2025
• Subjects: Gaussian distribution; Logic gates; Nanoscale devices; normal distribution; oxide thickness variation; Random discrete dopant; Thickness measurement; Threshold voltage; Transconductance; Very large scale integration; Voltage measurement; Weibull distribution

The proposed work endeavours to present a statistical study to determine the nature of variation of the major performance parameter i.e. voltage gain of a low power Folded Cascode Operational Transconductance Amplifier (OTA) subject to variations of the two major process parameters-threshold voltage...