Investigation of regularity of plasma formation in large volume on the basis of the hollow cathode effect using high-frequency short-pulsed voltage
The regularities of the nitrogen and argon plasma formation in a hollow cathode with the volume up to 0.2-0.5 m 3 using the short-pulsed (1-10 μs) high-frequency (100 kHz) voltage to 3 kV are presented in the paper. It is shown that despite the pulsed nature of voltage, the gaseous discharge steadil...
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Published in | 2012 7th International Forum on Strategic Technology (IFOST) pp. 1 - 2 |
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Main Authors | , , , |
Format | Conference Proceeding |
Language | English |
Published |
IEEE
01.09.2012
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Subjects | |
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Abstract | The regularities of the nitrogen and argon plasma formation in a hollow cathode with the volume up to 0.2-0.5 m 3 using the short-pulsed (1-10 μs) high-frequency (100 kHz) voltage to 3 kV are presented in the paper. It is shown that despite the pulsed nature of voltage, the gaseous discharge steadily burns at the pressure of 0.1 Pa and higher, the discharge current value and plasma concentration grow as the voltage pulse duration and voltage amplitude increase, the general discharge current reaches 10 A, providing the density of the ion saturation current on the items placed in plasma up to 0.5 mA/cm 2 . |
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AbstractList | The regularities of the nitrogen and argon plasma formation in a hollow cathode with the volume up to 0.2-0.5 m 3 using the short-pulsed (1-10 μs) high-frequency (100 kHz) voltage to 3 kV are presented in the paper. It is shown that despite the pulsed nature of voltage, the gaseous discharge steadily burns at the pressure of 0.1 Pa and higher, the discharge current value and plasma concentration grow as the voltage pulse duration and voltage amplitude increase, the general discharge current reaches 10 A, providing the density of the ion saturation current on the items placed in plasma up to 0.5 mA/cm 2 . |
Author | Ananin, P. S. Ryabchikov, A. I. Sivin, D. O. Dodorin, K. Y. |
Author_xml | – sequence: 1 givenname: A. I. surname: Ryabchikov fullname: Ryabchikov, A. I. email: ralex@tpu.ru organization: Nat. Res. Tomsk Polytech. Univ., Tomsk, Russia – sequence: 2 givenname: D. O. surname: Sivin fullname: Sivin, D. O. organization: Nat. Res. Tomsk Polytech. Univ., Tomsk, Russia – sequence: 3 givenname: P. S. surname: Ananin fullname: Ananin, P. S. organization: Nat. Res. Tomsk Polytech. Univ., Tomsk, Russia – sequence: 4 givenname: K. Y. surname: Dodorin fullname: Dodorin, K. Y. organization: Nat. Res. Tomsk Polytech. Univ., Tomsk, Russia |
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SubjectTerms | Argon Cathodes Discharges (electric) Fault location Glow discharges high-voltage repetitively pulsed source hollow cathode nitrogen and argon plasma Plasmas |
Title | Investigation of regularity of plasma formation in large volume on the basis of the hollow cathode effect using high-frequency short-pulsed voltage |
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