OH radical generation by atmospheric pressure plasma and its quantitative analysis by monitoring CO oxidation

• Published in: Conference Record of the 1999 IEEE Industry Applications Conference. Thirty-Forth IAS Annual Meeting (Cat. No.99CH36370) Vol. 3; pp. 1473 - 1477 vol.3
• Main Authors: Su, Z., Hyun-Ha Kim, Tsutsui, M., Takashima, K., Mizuno, A.
• Format: Conference Proceeding
• Language: English
• Published: IEEE 1999
• Subjects: Argon; Atmospheric measurements; Atmospheric-pressure plasmas; Plasma chemistry; Plasma measurements; Plasma temperature; Pollution measurement; Pulse measurements; Temperature dependence; Temperature distribution

The nonthermal plasma process has been studied to promote chemical reactions for decomposition of gaseous pollutants, or sterilization. This process uses radicals produced in the plasma. One of difficult problems for understanding the plasma process is to measure concentrations of radicals. There ar...