Characteristics of post-annealed SrTiO3 thin films prepared by mirror-confinement-type ECR plasma sputtering

SrTiO 3 films were synthesized on Pt/Ti/SiO 2 /Si multilayer substrates by mirror-confinement-type ECR plasma sputtering without substrate heating. All films were found to be well crystallized at a substrate temperature below 450 K. A low temperature post-annealing of the films by electromagnetic-wa...

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Bibliographic Details
Published inScience and technology of advanced materials Vol. 1; no. 4; pp. 211 - 217
Main Authors Baba, So, Numata, Ken, Miyake, Shoji
Format Journal Article
LanguageEnglish
Published Taylor & Francis 01.01.2000
IOP Publishing
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