Characteristics of post-annealed SrTiO3 thin films prepared by mirror-confinement-type ECR plasma sputtering

• Published in: Science and technology of advanced materials Vol. 1; no. 4; pp. 211 - 217
• Main Authors: Baba, So, Numata, Ken, Miyake, Shoji
• Format: Journal Article
• Language: English
• Published: Taylor & Francis 01.01.2000; IOP Publishing
• Subjects: Electromagnetic-wave radiation; Low temperature synthesis; Mirror-confinement-type ECR plasma sputtering; Post-annealing; SrTiO

SrTiO 3 films were synthesized on Pt/Ti/SiO 2 /Si multilayer substrates by mirror-confinement-type ECR plasma sputtering without substrate heating. All films were found to be well crystallized at a substrate temperature below 450 K. A low temperature post-annealing of the films by electromagnetic-wa...