Dielectric screening effect on exciton resonance energy in monolayer WS2 on SiO2/Si substrate
We studied the dielectric screening effects by a SiO2/Si substrate on the excitonic properties of monolayer WS2 by means of microscopic reflectance and photoluminescence spectroscopy. Through the observation of high-order exciton resonances from 1s to 5s at 10 K, we estimated the band gap and excito...
Saved in:
Published in | Journal of physics. Conference series Vol. 1220; no. 1 |
---|---|
Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Bristol
IOP Publishing
01.05.2019
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | We studied the dielectric screening effects by a SiO2/Si substrate on the excitonic properties of monolayer WS2 by means of microscopic reflectance and photoluminescence spectroscopy. Through the observation of high-order exciton resonances from 1s to 5s at 10 K, we estimated the band gap and exciton binding energy. Our theoretical calculation using the screened Keldysh potential well reproduced the high-order Rydberg energies. In addition, we discussed the deviation of oscillator strength obtained from experimental results in comparison with theoretical calculation. |
---|---|
AbstractList | We studied the dielectric screening effects by a SiO2/Si substrate on the excitonic properties of monolayer WS2 by means of microscopic reflectance and photoluminescence spectroscopy. Through the observation of high-order exciton resonances from 1s to 5s at 10 K, we estimated the band gap and exciton binding energy. Our theoretical calculation using the screened Keldysh potential well reproduced the high-order Rydberg energies. In addition, we discussed the deviation of oscillator strength obtained from experimental results in comparison with theoretical calculation. |
Author | Arai, Masaya Kajino, Yuto Oto, Kenichi Yamada, Yasuhiro |
Author_xml | – sequence: 1 givenname: Yuto surname: Kajino fullname: Kajino, Yuto email: kajino@chiba-u.jp organization: Department of Physics, Chiba University , Japan – sequence: 2 givenname: Masaya surname: Arai fullname: Arai, Masaya organization: Department of Physics, Chiba University , Japan – sequence: 3 givenname: Kenichi surname: Oto fullname: Oto, Kenichi organization: Department of Physics, Chiba University , Japan – sequence: 4 givenname: Yasuhiro surname: Yamada fullname: Yamada, Yasuhiro email: yasuyamada@chiba-u.jp organization: Department of Physics, Chiba University , Japan |
BookMark | eNptkG9LwzAQh4NMcJt-BgO-E2pzSZu2L2X-ZzChiq-kpOl1ZMxkNh24b2_KZCKYN79w99wdPBMyss4iIefAroDleQxZwiOZFjIGzlkMMQPORHpExofO6PDP8xMy8X7FmAgvG5P3G4Nr1H1nNPW6Q7TGLim2bahRZyl-adOH7NA7q6xGiha75Y4aSz-cdWu1w46-lXyAS7PgcWmo39a-71SPp-S4VWuPZz85Ja93ty-zh2i-uH-cXc8jIwD6qOF1LXnOZaEThY1KdZIpntWt5CkIFNBywZRK8jRrctYwXoTUbVKghAy0FlNysd-76dznFn1frdy2s-FkxVMpIc0A0kBd7injNr_A0_OsrAZ1FVR7ddWmaQMs_oEhUEF6NeisBrV_J8U348l0jQ |
ContentType | Journal Article |
Copyright | Published under licence by IOP Publishing Ltd 2019. This work is published under http://creativecommons.org/licenses/by/3.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License. |
Copyright_xml | – notice: Published under licence by IOP Publishing Ltd – notice: 2019. This work is published under http://creativecommons.org/licenses/by/3.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License. |
DBID | O3W TSCCA 8FD 8FE 8FG ABUWG AFKRA ARAPS AZQEC BENPR BGLVJ CCPQU DWQXO H8D HCIFZ L7M P5Z P62 PIMPY PQEST PQQKQ PQUKI PRINS |
DOI | 10.1088/1742-6596/1220/1/012035 |
DatabaseName | Open Access: IOP Publishing Free Content IOPscience (Open Access) Technology Research Database ProQuest SciTech Collection ProQuest Technology Collection ProQuest Central (Alumni) ProQuest Central Advanced Technologies & Aerospace Collection ProQuest Central Essentials ProQuest Central Technology Collection ProQuest One Community College ProQuest Central Aerospace Database SciTech Premium Collection Advanced Technologies Database with Aerospace Advanced Technologies & Aerospace Database ProQuest Advanced Technologies & Aerospace Collection Publicly Available Content Database ProQuest One Academic Eastern Edition (DO NOT USE) ProQuest One Academic ProQuest One Academic UKI Edition ProQuest Central China |
DatabaseTitle | Publicly Available Content Database Advanced Technologies & Aerospace Collection Technology Collection Technology Research Database ProQuest Advanced Technologies & Aerospace Collection ProQuest Central Essentials ProQuest One Academic Eastern Edition ProQuest Central (Alumni Edition) SciTech Premium Collection ProQuest One Community College ProQuest Technology Collection ProQuest SciTech Collection ProQuest Central China ProQuest Central Advanced Technologies & Aerospace Database Aerospace Database ProQuest One Academic UKI Edition ProQuest Central Korea ProQuest One Academic Advanced Technologies Database with Aerospace |
DatabaseTitleList | Publicly Available Content Database |
Database_xml | – sequence: 1 dbid: O3W name: Open Access: IOP Publishing Free Content url: http://iopscience.iop.org/ sourceTypes: Enrichment Source Publisher – sequence: 2 dbid: 8FG name: ProQuest Technology Collection url: https://search.proquest.com/technologycollection1 sourceTypes: Aggregation Database |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Physics |
DocumentTitleAlternate | Dielectric screening effect on exciton resonance energy in monolayer WS2 on SiO2/Si substrate |
EISSN | 1742-6596 |
ExternalDocumentID | JPCS_1220_1_012035 |
GroupedDBID | 1JI 29L 2WC 4.4 5B3 5GY 5PX 5VS 7.Q AAJIO AAJKP ABHWH ACAFW ACHIP AEFHF AEJGL AFKRA AFYNE AIYBF AKPSB ALMA_UNASSIGNED_HOLDINGS ARAPS ASPBG ATQHT AVWKF AZFZN BENPR BGLVJ CCPQU CEBXE CJUJL CRLBU CS3 DU5 E3Z EBS EDWGO EJD EQZZN F5P FRP GROUPED_DOAJ GX1 HCIFZ HH5 IJHAN IOP IZVLO J9A KNG KQ8 LAP N5L N9A O3W OK1 P2P PIMPY PJBAE RIN RNS RO9 ROL SY9 T37 TR2 TSCCA UCJ W28 XSB ~02 8FD 8FE 8FG ABUWG AZQEC DWQXO H8D L7M P62 PQEST PQQKQ PQUKI PRINS |
ID | FETCH-LOGICAL-i311t-d2bb628269c4aeda5c47a27bf62513e31f230aa4857d80d0297d8cf49e6171cc3 |
IEDL.DBID | IOP |
ISSN | 1742-6588 |
IngestDate | Thu Oct 10 20:13:04 EDT 2024 Fri Jan 08 09:41:25 EST 2021 Wed Aug 21 03:40:15 EDT 2024 |
IsDoiOpenAccess | true |
IsOpenAccess | true |
IsPeerReviewed | true |
IsScholarly | true |
Issue | 1 |
Language | English |
License | Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI. |
LinkModel | DirectLink |
MergedId | FETCHMERGED-LOGICAL-i311t-d2bb628269c4aeda5c47a27bf62513e31f230aa4857d80d0297d8cf49e6171cc3 |
OpenAccessLink | https://proxy.k.utb.cz/login?url=https://iopscience.iop.org/article/10.1088/1742-6596/1220/1/012035 |
PQID | 2566157115 |
PQPubID | 4998668 |
PageCount | 4 |
ParticipantIDs | proquest_journals_2566157115 iop_journals_10_1088_1742_6596_1220_1_012035 |
PublicationCentury | 2000 |
PublicationDate | 20190501 |
PublicationDateYYYYMMDD | 2019-05-01 |
PublicationDate_xml | – month: 05 year: 2019 text: 20190501 day: 01 |
PublicationDecade | 2010 |
PublicationPlace | Bristol |
PublicationPlace_xml | – name: Bristol |
PublicationTitle | Journal of physics. Conference series |
PublicationTitleAlternate | J. Phys.: Conf. Ser |
PublicationYear | 2019 |
Publisher | IOP Publishing |
Publisher_xml | – name: IOP Publishing |
SSID | ssj0033337 |
Score | 2.2464025 |
Snippet | We studied the dielectric screening effects by a SiO2/Si substrate on the excitonic properties of monolayer WS2 by means of microscopic reflectance and... |
SourceID | proquest iop |
SourceType | Aggregation Database Enrichment Source Publisher |
SubjectTerms | Excitons Mathematical analysis Monolayers Photoluminescence Physics Screening Silicon dioxide Silicon substrates |
SummonAdditionalLinks | – databaseName: ProQuest Technology Collection dbid: 8FG link: http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwEA9uIvgifuJ0SkAfDW2TfqRPItM5Bn7AHO5FQpqk0Jd22gn--V7SljEE-9jeSy-Xu_sld_dD6DqX3I84j4jMtSYQ8TiRRvokSWmkGYtTHdpG4afneDIPp4to0R641W1ZZecTnaPWlbJn5B6EZgi-CSQwt8tPYlmj7O1qS6HRQ9sBTRJr1Xz82HliBk_SNERSApGWd_VdAPrad2nsBZT6XuDZJlLL-dYrquUfv-yCzXgf7bVZIr5rlvUAbZnyEO24ak1VH6GP-6KhrykUhm0PUBQCEG5KM3BVYvOjYKOWGKB0ZQdqGGxcix8uSgz_AWgWEm38PqNWeFa8UG9W4BpciBtVe4zm44e30YS0PAmkYEGwIppmWQzQKU5VKI2WkQoTSZMsB2zjDjlzwBlShjxKNPe1pavSXOVhaiB9CZRiJ6hfVqU5RThVkmrJcpYxO1jfzyI_BEQnDaCKNFbZAN2AfkRr57VwV9icC6tOYdUprDpFIBp1DtDVhvj0dTTblBBLnQ_QsFP3WnS93mf_fz5Hu5DEpE0R4hD1V1_f5gIShVV26azhF8zWtqU priority: 102 providerName: ProQuest |
Title | Dielectric screening effect on exciton resonance energy in monolayer WS2 on SiO2/Si substrate |
URI | https://iopscience.iop.org/article/10.1088/1742-6596/1220/1/012035 https://www.proquest.com/docview/2566157115 |
Volume | 1220 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwpV1LS8QwEB58IHjxLa6PJaBHu22Tpk2PvtYH6C6uohcpaZJCEbririD-eidNF194EHsoPUyadJrMfF87MwHYK6QIuBDck4XWHno84UkjAy9JKdeMxamObKLw5VV8dhtd3PP7z7kww6fG9Hfw0hUKdipsAuKEjxiaejFPYz-kNPBD3-Z_Mj4NswxXjJ3Z573-xBozPBKXFGkbCTGJ8fr9RuhlsOsftrl2ON1FUJOhujiTx87LOO-ot29VHP_3LEuw0OBRcuBaLMOUqVZgro4LVaNVeDgu3UY5pSJoYJD0oqsjLgiEDCtiXhWahIogaR_a0h2GmDqZkJQVwQmOvBkhPbkbUCs8KHvUH5RkhMaqLoq7Brfdk5ujM6_ZkcErWRiOPU3zPEaSFqcqkkZLrqJE0iQvkEXVn1MLZDRSRoInWgTaboylhSqi1CBQCpVi6zBTDSuzASRVkmrJCpYzW8I_yHkQIXeUBvlLGqu8BfuotKxZUaOs_lkuRGY1llmNZVZjWZg5jbVg94v4Rf9o8FUie9JFC7YnL_VDFEEfwroEofHm3_rcgnmET6kLf9yGmfHzi9lBiDLO2zAtuqdtmD08uepft6274O16XuK5x-7eAT5m2zY |
link.rule.ids | 315,783,787,12779,21402,27938,27939,33387,33758,38879,38904,43614,43819,53856,53882 |
linkProvider | IOP Publishing |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3NS8MwFA9uInoRP3E6NaBHQ9ukH-lJZDrn3KawDXeRkCYp9NJON8E_35e2Y4hgj-279CV5v_d7eR8IXaeSuwHnAZGp1gQQjxNppEuimAaasTDWvi0UHo7C3tTvz4JZHXBb1GmVK5tYGmpdKBsjdwCaAXwjcGBu5x_ETo2yt6v1CI0G2vQZAI2tFO8-riwxgyeqCiIpAaTlq_wuIH31uzh0PEpdx3NsEamd-dbIivkfu1yCTXcP7dZeIr6rlnUfbZj8AG2V2ZpqcYje77NqfE2mMBx7oKIAQLhKzcBFjs23goOaY6DShW2oYbApS_xwlmP4D2Cz4GjjtzG1wuPshTrjDC_AhJStao_QtPsw6fRIPSeBZMzzlkTTJAmBOoWx8qXRMlB-JGmUpMBtyiBnCjxDSp8HkeautuOqNFepHxtwXzyl2DFq5kVuThCOlaRaspQlzDbWd5PA9YHRSQOsIg5V0kI3oB9R7_OFKK-wORdWncKqU1h1Ck9U6myhq1_i_dfO-LeEmOu0hdorda9F1-t9-v_nS7TdmwwHYvA0ej5DO-DQxFVCYhs1l59f5hychmVyUe6MH23muYc |
linkToPdf | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwlV1LT4NAEJ7UGo0X4zPW5yZ6FIFdFpajaW1qfTWpjV7MZtldEi7U2Jr4850FqjHGg5w4DCwZZme-D-YBcJYrEXAhuKdyYzyMeMJTVgVeklJuGItTE7lC4bv7eDCJhs_8uQX9r1qY6Wvj-i_wtG4UXKuwSYgTPmJo6sU8jf2Q0sAPfVf_ybj_avIlWMYNLNwkgwf2tPDIDI-kLox0FwqxyPP6-2YYaXD5X_65Cjr9DVhv0CK5rJ9tE1q23IKVKmtTz7bhpVfUY2wKTXD7IyXFQETqFA0yLYn90LhhS4KUeuoaa1hiq1I_UpQEzQ9ZLQJu8jSmTnhcPFB_XJAZupKqZe0OTPpXj92B18xL8AoWhnPP0CyLkULFqY6UNYrrKFE0yXLkONXHzhz5hlKR4IkRgXFjq4zQeZRahDGh1mwX2uW0tHtAUq2oUSxnGXMN9oOMBxEyO2WRXaSxzjpwjvqRjb3PZPUrWwjp1CmdOqVTpwxlrc4OnP4QH466458SEt9eBw4X6v4WRUiGoCtB4Lr_vzVPYHXU68vb6_ubA1hDnJPWeYqH0J6_vdsjxBLz7LgylE_aj7rJ |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Dielectric+screening+effect+on+exciton+resonance+energy+in+monolayer+WS2+on+SiO2%2FSi+substrate&rft.jtitle=Journal+of+physics.+Conference+series&rft.au=Kajino%2C+Yuto&rft.au=Arai%2C+Masaya&rft.au=Oto%2C+Kenichi&rft.au=Yamada%2C+Yasuhiro&rft.date=2019-05-01&rft.pub=IOP+Publishing&rft.issn=1742-6588&rft.eissn=1742-6596&rft.volume=1220&rft.issue=1&rft_id=info:doi/10.1088%2F1742-6596%2F1220%2F1%2F012035&rft.externalDocID=JPCS_1220_1_012035 |
thumbnail_l | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=1742-6588&client=summon |
thumbnail_m | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=1742-6588&client=summon |
thumbnail_s | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=1742-6588&client=summon |