Huang, D., Shao, G., Zhang, X., & Zhou, Z. (2025). Electronic mechanism behind the influence of intercalated heteroatom Sn on the slip energy barrier in layered WS2. Nanotechnology, 36(22), . https://doi.org/10.1088/1361-6528/add166
Chicago Style (17th ed.) CitationHuang, Dulin, Gonglei Shao, Xu Zhang, and Zhen Zhou. "Electronic Mechanism Behind the Influence of Intercalated Heteroatom Sn on the Slip Energy Barrier in Layered WS2." Nanotechnology 36, no. 22 (2025). https://doi.org/10.1088/1361-6528/add166.
MLA (9th ed.) CitationHuang, Dulin, et al. "Electronic Mechanism Behind the Influence of Intercalated Heteroatom Sn on the Slip Energy Barrier in Layered WS2." Nanotechnology, vol. 36, no. 22, 2025, https://doi.org/10.1088/1361-6528/add166.
Warning: These citations may not always be 100% accurate.