Spatial distribution of SiCln (n=0–2) in SiCl4 plasma measured by mass spectroscopy
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Published in | Chinese physics (Beijing, China) Vol. 15; p. 2374 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
IOP Publishing
01.10.2006
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Online Access | Get full text |
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