Impact of Wafer Pre-thin Thickness on Stealth Dicing Performance
Stealth dicing (SD) is a low-cost and precise semiconductor assembly process that induces subsurface damage with infrared light to separate wafer into individual dies. Pre-thinning is a critical step that reduces wafer thickness and stress, enhancing efficiency and lowering defect risks before SD pr...
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Published in | 2023 IEEE 25th Electronics Packaging Technology Conference (EPTC) pp. 701 - 704 |
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Main Authors | , , , |
Format | Conference Proceeding |
Language | English |
Published |
IEEE
05.12.2023
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Subjects | |
Online Access | Get full text |
DOI | 10.1109/EPTC59621.2023.10457881 |
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Abstract | Stealth dicing (SD) is a low-cost and precise semiconductor assembly process that induces subsurface damage with infrared light to separate wafer into individual dies. Pre-thinning is a critical step that reduces wafer thickness and stress, enhancing efficiency and lowering defect risks before SD process. However, wafer pre-thin thickness might impact temperature and stress distribution during the laser absorption and internal crack propagation, subsequently affecting the dicing performance. In this study, the impact of wafer pre-thin thickness on the SD performance was evaluated through the simulation model and fracture analysis for SD process. This provides better understanding and insight on the dicing performance with the change in wafer pre-thin thickness. |
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AbstractList | Stealth dicing (SD) is a low-cost and precise semiconductor assembly process that induces subsurface damage with infrared light to separate wafer into individual dies. Pre-thinning is a critical step that reduces wafer thickness and stress, enhancing efficiency and lowering defect risks before SD process. However, wafer pre-thin thickness might impact temperature and stress distribution during the laser absorption and internal crack propagation, subsequently affecting the dicing performance. In this study, the impact of wafer pre-thin thickness on the SD performance was evaluated through the simulation model and fracture analysis for SD process. This provides better understanding and insight on the dicing performance with the change in wafer pre-thin thickness. |
Author | Vempaty, Venkata Rama Satya Pradeep Singh, Harjashan Veer Lim, Dao Kun Sim, Wen How |
Author_xml | – sequence: 1 givenname: Dao Kun surname: Lim fullname: Lim, Dao Kun email: dklim@micron.com organization: Micron Semiconductor Asia Operations Pte. Ltd.,Singapore,339942 – sequence: 2 givenname: Venkata Rama Satya Pradeep surname: Vempaty fullname: Vempaty, Venkata Rama Satya Pradeep organization: Micron Semiconductor Asia Operations Pte. Ltd.,Singapore,339942 – sequence: 3 givenname: Wen How surname: Sim fullname: Sim, Wen How organization: Micron Semiconductor Asia Operations Pte. Ltd.,Singapore,339942 – sequence: 4 givenname: Harjashan Veer surname: Singh fullname: Singh, Harjashan Veer organization: Micron Semiconductor Asia Operations Pte. Ltd.,Singapore,339942 |
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Snippet | Stealth dicing (SD) is a low-cost and precise semiconductor assembly process that induces subsurface damage with infrared light to separate wafer into... |
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SubjectTerms | Absorption Data models Laser modes Semiconductor device modeling Semiconductor lasers Simulation Temperature distribution |
Title | Impact of Wafer Pre-thin Thickness on Stealth Dicing Performance |
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