Impact of NaOH solution surface treatment on Al2O3/β-Ga2O3 MOS capacitors
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| Published in | Semiconductor science and technology Vol. 39; no. 8 |
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| Main Authors | , , , , , |
| Format | Journal Article |
| Language | English |
| Published |
IOP Publishing
01.08.2024
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| Subjects | |
| Online Access | Get full text |
| ISSN | 0268-1242 1361-6641 |
| DOI | 10.1088/1361-6641/ad59bc |
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| Author | Fang, Paiwen Wang, Xinzhong Su, Danni Pei, Yanli Liao, Zhengyi Liang, Jun |
|---|---|
| Author_xml | – sequence: 1 givenname: Paiwen surname: Fang fullname: Fang, Paiwen organization: State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-sen University , Guangzhou 510006, People’s Republic of China – sequence: 2 givenname: Zhengyi surname: Liao fullname: Liao, Zhengyi organization: State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-sen University , Guangzhou 510006, People’s Republic of China – sequence: 3 givenname: Danni surname: Su fullname: Su, Danni organization: State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-sen University , Guangzhou 510006, People’s Republic of China – sequence: 4 givenname: Jun surname: Liang fullname: Liang, Jun organization: State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-sen University , Guangzhou 510006, People’s Republic of China – sequence: 5 givenname: Xinzhong surname: Wang fullname: Wang, Xinzhong organization: Shenzhen Institute of Information Technology , Shenzhen 518172, People’s Republic of China – sequence: 6 givenname: Yanli orcidid: 0000-0003-3456-0746 surname: Pei fullname: Pei, Yanli organization: Foshan Institute of Sun Yat-Sen University , Foshan 528225, People’s Republic of China |
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| Copyright | 2024 IOP Publishing Ltd. All rights, including for text and data mining, AI training, and similar technologies, are reserved. |
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| DOI | 10.1088/1361-6641/ad59bc |
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| SubjectTerms | ALD-Al Ga MOSCAP NaOH treatment |
| Title | Impact of NaOH solution surface treatment on Al2O3/β-Ga2O3 MOS capacitors |
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