2300V Reverse Breakdown Voltage Ga2O3 Schottky Rectifiers
We report field-plated Schottky rectifiers of various dimensions (circular geometry with diameter 50-200 μm and square diodes with areas 4 × 10−3-10−2 cm2) fabricated on thick (20μm), lightly doped (n = 2.10 × 1015 cm −3) β-Ga2O3 epitaxial layers grown by Hydride Vapor Phase Epitaxy on conducting (n...
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Published in | ECS journal of solid state science and technology Vol. 7; no. 5; pp. Q92 - Q96 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
The Electrochemical Society
01.01.2018
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Online Access | Get full text |
ISSN | 2162-8769 |
DOI | 10.1149/2.0241805jss |
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Abstract | We report field-plated Schottky rectifiers of various dimensions (circular geometry with diameter 50-200 μm and square diodes with areas 4 × 10−3-10−2 cm2) fabricated on thick (20μm), lightly doped (n = 2.10 × 1015 cm −3) β-Ga2O3 epitaxial layers grown by Hydride Vapor Phase Epitaxy on conducting (n = 3.6 × 1018 cm−3) substrates grown by Edge-Defined, Film-Fed growth. The maximum reverse breakdown voltage (VB) was 2300V for a 150 μm diameter device (area = 1.77 × 10−4 cm−2), corresponding to a breakdown field of 1.15 MV.cm−1. The reverse current was only 15.6 μA at this voltage. This breakdown voltage is highest reported for Ga2O3 rectifiers. The on-state resistance (RON) for these devices was 0.25 Ω.cm2, leading to a figure of merit (VB2/RON) of 21.2 MW.cm−2. The Schottky barrier height of the Ni was 1.03 eV, with an ideality factor of 1.1 and a Richardson's constant of 43.35 A.cm−2.K−2 obtained from the temperature dependence of the forward current density. The breakdown voltages for the different size devices ranged from 1400-2300V, with a general, but not linear trend of decreasing breakdown voltage for larger area rectifiers. The reverse recovery time was ∼22 ns for switching from +2 V to −2 V. |
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AbstractList | We report field-plated Schottky rectifiers of various dimensions (circular geometry with diameter 50-200 μm and square diodes with areas 4 × 10−3-10−2 cm2) fabricated on thick (20μm), lightly doped (n = 2.10 × 1015 cm −3) β-Ga2O3 epitaxial layers grown by Hydride Vapor Phase Epitaxy on conducting (n = 3.6 × 1018 cm−3) substrates grown by Edge-Defined, Film-Fed growth. The maximum reverse breakdown voltage (VB) was 2300V for a 150 μm diameter device (area = 1.77 × 10−4 cm−2), corresponding to a breakdown field of 1.15 MV.cm−1. The reverse current was only 15.6 μA at this voltage. This breakdown voltage is highest reported for Ga2O3 rectifiers. The on-state resistance (RON) for these devices was 0.25 Ω.cm2, leading to a figure of merit (VB2/RON) of 21.2 MW.cm−2. The Schottky barrier height of the Ni was 1.03 eV, with an ideality factor of 1.1 and a Richardson's constant of 43.35 A.cm−2.K−2 obtained from the temperature dependence of the forward current density. The breakdown voltages for the different size devices ranged from 1400-2300V, with a general, but not linear trend of decreasing breakdown voltage for larger area rectifiers. The reverse recovery time was ∼22 ns for switching from +2 V to −2 V. |
Author | Pearton, S. J. Tadjer, Marko Ren, F. Yang, Jiancheng Kuramata, A. |
Author_xml | – sequence: 1 givenname: Jiancheng surname: Yang fullname: Yang, Jiancheng organization: University of Florida Department of Chemical Engineering, , USA – sequence: 2 givenname: F. orcidid: 0000-0001-9234-019X surname: Ren fullname: Ren, F. organization: University of Florida Department of Chemical Engineering, , USA – sequence: 3 givenname: Marko surname: Tadjer fullname: Tadjer, Marko organization: Naval Research Laboratory , USA – sequence: 4 givenname: S. J. orcidid: 0000-0001-6498-1256 surname: Pearton fullname: Pearton, S. J. organization: University of Florida Department of Materials Science and Engineering, , USA – sequence: 5 givenname: A. surname: Kuramata fullname: Kuramata, A. organization: Tamura Corporation and Novel Crystal Technology, Inc. , Japan |
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