Operation Parameters and Deposition Kinetics

• Published in: Magneto Luminous Chemical Vapor Deposition pp. 143 - 184
• Main Author: Yasuda, Hirotsugu
• Format: Book Chapter
• Language: English
• Published: United Kingdom CRC Press 2011; Taylor & Francis Group
• Subjects: Industrial chemistry; Materials science; Physical chemistry; Cathode Glow; Plasma Polymerization Process; Negative Glow; Luminous Gas Phase; Plasma Polymerization Reactor; Deposition Rate; Gas Phase; Anode Assembly; Conventional Free Radical Polymerization; RF Discharge; Plasma Polymer Coating; IG; Sccm CH4; Dg; Plasma Polymers Formed; Cathodic Polymerization; Cathode Surface; Monomer Gas; Glow Discharge; Plasma Polymer Deposition; Plasma Polymerization; XPS C1s Spectrum; System Pressure; Normalized Deposition Rate; Electron Binding Energy
• DOI: 10.1201/b11385-11
• ISBN: 9781439838778; 1439838771

It is generally considered, quite erroneously, that plasma polymerization starts when an electrical power switch is turned on, and ends when the switch is turned off. In reality, however, actual operation of plasma polymerization starts when the pumping of a reactor is initiated and contains multiple important steps that greatly in˜uence the outcome of plasma polymerization. The steps involved in the plasma polymerization coating depicted in Figure 8.1 [1], as changes of system pressure in each step as a function of operation time, might show the importance of the issue described above. Attention should be paid to the following points with respect to the in˜uence of operational parameters:1. The overall operation time for the case shown in Figure 8.1 is 50 minutes, in which plasma polymerization time is only 5 minutes.