Atomic Layer Deposition as a New Method for Rare-Earth Doping of Optical Fibers

A new method enabling engineering of gain materials at an atomic-scale level is for the first time applied to manufacturing of rare-earth doped optical fibers.

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Published in2007 Conference on Lasers and Electro-Optics (CLEO) pp. 1 - 2
Main Authors Norin, L., Vanin, E., Soininen, P., Putkonen, M.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.05.2007
Subjects
Atom optics
Atomic layer deposition
Coatings
Doping
Erbium
Glass
Manufacturing
Optical fibers
Preforms
Substrates
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Abstract A new method enabling engineering of gain materials at an atomic-scale level is for the first time applied to manufacturing of rare-earth doped optical fibers.
AbstractList A new method enabling engineering of gain materials at an atomic-scale level is for the first time applied to manufacturing of rare-earth doped optical fibers.
Author Vanin, E.
Norin, L.
Putkonen, M.
Soininen, P.
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  givenname: M.
  surname: Putkonen
  fullname: Putkonen, M.
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Snippet A new method enabling engineering of gain materials at an atomic-scale level is for the first time applied to manufacturing of rare-earth doped optical fibers.
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SubjectTerms Atom optics
Atomic layer deposition
Coatings
Doping
Erbium
Glass
Manufacturing
Optical fibers
Preforms
Substrates
Title Atomic Layer Deposition as a New Method for Rare-Earth Doping of Optical Fibers
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