Investigation of image placement errors in extreme ultraviolet lithography masks - Liang Zheng (International Conference on Advanced Technology of Design and Manufacture (ATDM 2010), 2010)
Keywords: Integrated circuits; Lithography (semiconductor technology); Semiconductor integrated circuits; extreme ultraviolet lithography masks; ultraviolet lithography; e-beam tool; exposure tool chucking; masks; EUVL mask fabrication; electrostatic chuck; image placement errors; EUVL mask fabrication process