Si/SiGe superlattice I/O finFETs in a vertically-stacked Gate-All-Around horizontal Nanowire Technology - Hellings, G.; Mertens, H.; Subirats, A.; Simoen, E.; Schram, T.; Ragnarsson, L.-A.; Simicic, M.; Chen, S.-H.; Parvais, B.; Boudier, D.; Cretu, B.; Machillot, J.; et al. (2018 IEEE Symposium on VLSI Technology, 2018)
Keywords: Electrostatic discharges; FinFETs; Ions; Logic gates; Silicon; Silicon germanium; Superlattices