Optical lithography below 100 nm

• Published in: Solid state technology Vol. 41; no. 11; pp. 59 - 67
• Main Author: BRUNING, J. H
• Format: Magazine Article
• Language: English
• Published: Tulsa, OK PennWell 01.11.1998; PennWell Publishing Corp
• Subjects: Applied sciences; Circuit properties; Electric, optical and optoelectronic circuits; Electronics; Exact sciences and technology; Fundamental areas of phenomenology (including applications); Integrated circuit fabrication; Integrated circuits; Integrated optics. Optical fibers and wave guides; Lenses, prisms, and mirrors; Lithography; Optical and optoelectronic circuits; Optical elements, devices, and systems; Optics; Optoelectronic devices; Optoelectronics; Physics; Semiconductor chips; United States; Integrated circuits; Numerical aperture; Scanning; Lithography; Critical parameter; Dimensions; Optical systems; Experimental study; Lenses