Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)

• Published in: Surface & coatings technology Vol. 305; pp. 158 - 164
• Main Authors: Wang, Li-Chun, Han, Yin-Yi, Yang, Kai-Chiang, Chen, Miin-Jang, Lin, Hsin-Chih, Lin, Chung-Kwei, Hsu, Yu-Tong
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 15.11.2016
• Subjects: Alumina; Aluminum oxide; Atomic layer deposition; Contact angle; Deposition; Hydrophilicity; Hydrophobicity; Polyvinyl chloride; Polyvinyl chlorides; Surface modification; Surface roughness; Thin films; Surface modification; Hydrophobicity; Polyvinyl chloride; Hydrophilicity; Atomic layer deposition; Alumina
• DOI: 10.1016/j.surfcoat.2016.08.023
• ISSN: 0257-8972

Thermal ALD (T-ALD) and plasma-enhanced ALD (PE-ALD) processes were employed to prepare the Al2O3 thin films on plasticized polyvinyl chloride (PVC) surfaces at a low deposition temperature of 80°C. The water contact angle test shows that the T-ALD Al2O3 films exhibited a hydrophobic surface, while the PE-ALD Al2O3 films were hydrophilic. The difference in the surface hydrophobicity is attributed to the carbon residue in Al2O3 films, as revealed by the X-ray photoelectron and Fourier transform infrared spectroscopies. The trend of hydrophobicity follows with the evolution of surface roughness of the T-Al2O3 films, indicating that the surface roughness contributed to the hydrophobicity as predicted by the Wenzel's mode. The result indicates that the surface hydrophilicity/hydrophobicity of the Al2O3 thin films can be modified and controlled by the deposition conditions of the ALD process. •The Al2O3 thin films were deposited on PVC by T-ALD and PE-ALD techniques.•The PE-ALD Al2O3 films exhibited a hydrophilic surface.•The T-ALD Al2O3 films exhibited a hydrophobic surface.•The carbon residue affects the hydrophilicity/hydrophobicity of the Al2O3 films.•The surface properties of the Al2O3 thin films can be modified by the ALD conditions.