Production of NiSi phase by grain boundary diffusion induced solid state reaction between Ni2Si and Si(100) substrate
Sketch of grain boundary diffusion of Si (blue) into Ni2Si film (yellow) forming NiSi (red). •New processing method for creation of homogeneous thin NiSi contacts from nanocrystalline-Ni2Si/Si(100) substrate.•The NiSi forms by grain-boundary diffusion and reaction in a certain low temperature-time a...
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Published in | Applied surface science Vol. 320; pp. 627 - 633 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier B.V
30.11.2014
Elsevier |
Subjects | |
Online Access | Get full text |
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