Dislocation reduction in large-diameter LEC GaAs growth: II. Microstructural characterization
Extensive microstructural characterization of undoped and isovalent (indium) doped, large diameter, semi-insulating GaAs crystals grown in a low gradient LEC configuration has been conducted. As indium is added to GaAs, a dramatic transition occurs in dislocation microstructure from cellular to axia...
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Published in | Journal of crystal growth Vol. 91; no. 4; pp. 567 - 575 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier B.V
1988
Elsevier |
Subjects | |
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Abstract | Extensive microstructural characterization of undoped and isovalent (indium) doped, large diameter, semi-insulating GaAs crystals grown in a low gradient LEC configuration has been conducted. As indium is added to GaAs, a dramatic transition occurs in dislocation microstructure from cellular to axial at an indium concentration corresponding to the onset of “lattice hardening”. Both continuous and discontinuous axial dislocations were identified. Characterization of crystals grown with lattice matched seeds, different crystallographic orientations, fully encapsulated melts, and necked seeds showed that reproducible growth of completely dislocation-free crystals remains as a formidable challenge. A model is proposed explaining the nucleation and propagation of axial dislocations in terms of radial inhomogeneities of the indium concentration at the growth interface. Approaches to achieving dislocation-free growth are presented based on this model. Finally, the correlation between dislocation and the EL2 defect center was found to follow the behavior previously reported for undoped material. |
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AbstractList | Extensive microstructural characterization of undoped and isovalent (indium) doped, large diameter, semi-insulating GaAs crystals grown in a low gradient LEC configuration has been conducted. As indium is added to GaAs, a dramatic transition occurs in dislocation microstructure from cellular to axial at an indium concentration corresponding to the onset of “lattice hardening”. Both continuous and discontinuous axial dislocations were identified. Characterization of crystals grown with lattice matched seeds, different crystallographic orientations, fully encapsulated melts, and necked seeds showed that reproducible growth of completely dislocation-free crystals remains as a formidable challenge. A model is proposed explaining the nucleation and propagation of axial dislocations in terms of radial inhomogeneities of the indium concentration at the growth interface. Approaches to achieving dislocation-free growth are presented based on this model. Finally, the correlation between dislocation and the EL2 defect center was found to follow the behavior previously reported for undoped material. Extensive microstructural characterization of undoped and isovalent (indium) doped, large diameter, semi-insulating GaAs crystals grown in a low gradient LEC configuration has been conducted. As indium is added to GaAs, a dramatic transition occurs in dislocation microstructure from cellular to axial at an indium concentration corresponding to the onset of 'lattice hardening'. Both continuous and discontinuous axial dislocations were identified. Characterization of crystals grown with lattice matched seeds, different crystallographic orientations, fully encapsulated melts, and necked seeds showed that reproducible growth of completely dislocation- free crystals remains as a formidable challenge. A model is proposed explaining the nucleation and propagation of axial dislocations in terms of radial inhomogeneities of the indium concentration at the growth interface. Approaches to achieving dislocation-free growth are presented based on this model. Finally, the correlation between dislocation and the EL2 defect center was found to follow the behavior previously reported for undoped material. (Author) |
Author | Kuwamoto, H. Holmes, D.E. |
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Keywords | Crystal growth Semiconductor materials Crystal orientation Doping Czochralski method X ray topography Experimental study Inorganic compound Dislocation Gallium Arsenides Mismatch lattice Liquid encapsulation Microstructure |
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References | Pichaud, Burle-Durbe, Minari (BIB10) 1985; 71 Kirkpatrick, Chen, Holmes, Asbeck, Elliott, Fairman, Oliver (BIB1) 1983; Vol. 20 Bond (BIB4) 1960; 13 Skolnick, Brozel, Reed, Grant, Stirland, Ware (BIB18) 1984; 13 Barrett, McGuigan, Hobood, Eldridge, Thomas (BIB8) 1984; 70 Martin (BIB5) 1981; 39 Nanishi, Ishida, Honda, Yamazaki, Miyazawa (BIB2) 1982; 21 Holmes, Kuwamoto, Sandberg, Johnston (BIB3) 1988; 91 Kohda, Yamada, Nakanishi, Kobayashi, Osaka, Hoshikawa (BIB11) 1985; 71 Kitano, Matsui, Ishikawa (BIB13) 1985; 24 Nakajima, Katsumata, Terashima, Ishida (BIB9) 1985; 24 Martin, Farges, Jacob, Hallais, Poiblaud (BIB23) 1980; 51 Brozel, Grant, Ware, Stirland (BIB25) 1983; 42 Nakajima, Fujii, Ishida (BIB16) 1987; 84 McGigan, Thomas, Barrett, Eldridge, Messham, Swanson (BIB15) 1986; 76 Jacob, Farges, Schemali, Duseaux, Hallais, Bartels, Roksnoer (BIB21) 1982; 57 Alt, Packeiser (BIB27) 1986; 60 Klapper, Kuppers (BIB22) 1973; A29 Jacob, Duseaux, Farges, van den Boom, Roksnoer (BIB6) 1983; 61 Elliot, Wei, Farrare, Woolhouse, Scott, Hiskes (BIB7) 1983; 70 Yamada, Kohda, Nakanishi, Hoshikawa (BIB14) 1986; 78 Scott, Laderman, Elliot (BIB12) 1985; 47 Grabmaier, Grabmaier (BIB20) 1972; 13/14 Holmes, Chen, Elliot, Kirkpatrick (BIB24) 1982; 40 Holmes, Chen (BIB26) 1984; 55 Ono, Kitano, Matsui (BIB17) 1987; 51 Chen, Holmes (BIB19) 1983; 61 |
References_xml | – volume: 24 start-page: L948 year: 1985 ident: BIB13 publication-title: Japan. J. Appl. Phys. contributor: fullname: Ishikawa – volume: 84 start-page: 295 year: 1987 ident: BIB16 publication-title: J. Crystal Growth contributor: fullname: Ishida – volume: 39 start-page: 747 year: 1981 ident: BIB5 publication-title: Appl. Phys. Letters contributor: fullname: Martin – volume: 57 start-page: 493 year: 1982 ident: BIB21 publication-title: J. Crystal Growth contributor: fullname: Roksnoer – volume: 13/14 start-page: 635 year: 1972 ident: BIB20 publication-title: J. Crystal Growth contributor: fullname: Grabmaier – volume: Vol. 20 year: 1983 ident: BIB1 publication-title: Semiconductors and Semimetals contributor: fullname: Oliver – volume: 78 start-page: 36 year: 1986 ident: BIB14 publication-title: J. Crystal Growth contributor: fullname: Hoshikawa – volume: 47 start-page: 1280 year: 1985 ident: BIB12 publication-title: Appl. Phys. Letters contributor: fullname: Elliot – volume: 70 start-page: 169 year: 1983 ident: BIB7 publication-title: J. Crystal Growth contributor: fullname: Hiskes – volume: 71 start-page: 648 year: 1985 ident: BIB10 publication-title: J. Crystal Growth contributor: fullname: Minari – volume: 51 start-page: 2840 year: 1980 ident: BIB23 publication-title: J. Appl. Phys. contributor: fullname: Poiblaud – volume: 70 start-page: 179 year: 1984 ident: BIB8 publication-title: J. Crystal Growth contributor: fullname: Thomas – volume: 61 start-page: 111 year: 1983 ident: BIB19 publication-title: J. Crystal Growth contributor: fullname: Holmes – volume: 55 start-page: 3588 year: 1984 ident: BIB26 publication-title: J. Appl. Phys. contributor: fullname: Chen – volume: A29 start-page: 495 year: 1973 ident: BIB22 publication-title: Acta Cryst. contributor: fullname: Kuppers – volume: 51 start-page: 238 year: 1987 ident: BIB17 publication-title: Appl. Phys. Letters contributor: fullname: Matsui – volume: 40 start-page: 46 year: 1982 ident: BIB24 publication-title: Appl. Phys. Letters contributor: fullname: Kirkpatrick – volume: 21 start-page: L335 year: 1982 ident: BIB2 publication-title: Japan. J. Appl. Phys. contributor: fullname: Miyazawa – volume: 76 start-page: 217 year: 1986 ident: BIB15 publication-title: J. Crystal Growth contributor: fullname: Swanson – volume: 91 start-page: 557 year: 1988 ident: BIB3 publication-title: J. Crystal Growth contributor: fullname: Johnston – volume: 61 start-page: 417 year: 1983 ident: BIB6 publication-title: J. Crystal Growth contributor: fullname: Roksnoer – volume: 42 start-page: 610 year: 1983 ident: BIB25 publication-title: Appl. Phys. Letters contributor: fullname: Stirland – volume: 24 start-page: L65 year: 1985 ident: BIB9 publication-title: Japan. J. Appl. Phys. contributor: fullname: Ishida – volume: 13 start-page: 814 year: 1960 ident: BIB4 publication-title: Acta Cryst. contributor: fullname: Bond – volume: 13 start-page: 107 year: 1984 ident: BIB18 publication-title: J. Electron. Mater. contributor: fullname: Ware – volume: 71 start-page: 813 year: 1985 ident: BIB11 publication-title: J. Crystal Growth contributor: fullname: Hoshikawa – volume: 60 start-page: 2954 year: 1986 ident: BIB27 publication-title: J. Appl. Phys. contributor: fullname: Packeiser |
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SubjectTerms | Cross-disciplinary physics: materials science; rheology Exact sciences and technology Materials science Methods of crystal growth; physics of crystal growth Physics Theory and models of crystal growth; physics of crystal growth, crystal morphology and orientation |
Title | Dislocation reduction in large-diameter LEC GaAs growth: II. Microstructural characterization |
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