Dislocation reduction in large-diameter LEC GaAs growth: II. Microstructural characterization

Extensive microstructural characterization of undoped and isovalent (indium) doped, large diameter, semi-insulating GaAs crystals grown in a low gradient LEC configuration has been conducted. As indium is added to GaAs, a dramatic transition occurs in dislocation microstructure from cellular to axia...

Full description

Saved in:
Bibliographic Details
Published inJournal of crystal growth Vol. 91; no. 4; pp. 567 - 575
Main Authors Kuwamoto, H., Holmes, D.E.
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 1988
Elsevier
Subjects
Online AccessGet full text

Cover

Loading…
Abstract Extensive microstructural characterization of undoped and isovalent (indium) doped, large diameter, semi-insulating GaAs crystals grown in a low gradient LEC configuration has been conducted. As indium is added to GaAs, a dramatic transition occurs in dislocation microstructure from cellular to axial at an indium concentration corresponding to the onset of “lattice hardening”. Both continuous and discontinuous axial dislocations were identified. Characterization of crystals grown with lattice matched seeds, different crystallographic orientations, fully encapsulated melts, and necked seeds showed that reproducible growth of completely dislocation-free crystals remains as a formidable challenge. A model is proposed explaining the nucleation and propagation of axial dislocations in terms of radial inhomogeneities of the indium concentration at the growth interface. Approaches to achieving dislocation-free growth are presented based on this model. Finally, the correlation between dislocation and the EL2 defect center was found to follow the behavior previously reported for undoped material.
AbstractList Extensive microstructural characterization of undoped and isovalent (indium) doped, large diameter, semi-insulating GaAs crystals grown in a low gradient LEC configuration has been conducted. As indium is added to GaAs, a dramatic transition occurs in dislocation microstructure from cellular to axial at an indium concentration corresponding to the onset of “lattice hardening”. Both continuous and discontinuous axial dislocations were identified. Characterization of crystals grown with lattice matched seeds, different crystallographic orientations, fully encapsulated melts, and necked seeds showed that reproducible growth of completely dislocation-free crystals remains as a formidable challenge. A model is proposed explaining the nucleation and propagation of axial dislocations in terms of radial inhomogeneities of the indium concentration at the growth interface. Approaches to achieving dislocation-free growth are presented based on this model. Finally, the correlation between dislocation and the EL2 defect center was found to follow the behavior previously reported for undoped material.
Extensive microstructural characterization of undoped and isovalent (indium) doped, large diameter, semi-insulating GaAs crystals grown in a low gradient LEC configuration has been conducted. As indium is added to GaAs, a dramatic transition occurs in dislocation microstructure from cellular to axial at an indium concentration corresponding to the onset of 'lattice hardening'. Both continuous and discontinuous axial dislocations were identified. Characterization of crystals grown with lattice matched seeds, different crystallographic orientations, fully encapsulated melts, and necked seeds showed that reproducible growth of completely dislocation- free crystals remains as a formidable challenge. A model is proposed explaining the nucleation and propagation of axial dislocations in terms of radial inhomogeneities of the indium concentration at the growth interface. Approaches to achieving dislocation-free growth are presented based on this model. Finally, the correlation between dislocation and the EL2 defect center was found to follow the behavior previously reported for undoped material. (Author)
Author Kuwamoto, H.
Holmes, D.E.
Author_xml – sequence: 1
  givenname: H.
  surname: Kuwamoto
  fullname: Kuwamoto, H.
– sequence: 2
  givenname: D.E.
  surname: Holmes
  fullname: Holmes, D.E.
BackLink http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=7326361$$DView record in Pascal Francis
BookMark eNo9kE1LAzEQhoNUsK3-Aw85iOhha742yXoQSq21UPGiRwlpkm0j292a7Cr6601r8TQD88zLzDMAvbqpHQDnGI0wwvwGIUIyRJi8kvK6QJiwTB6BPpaCZnka9kD_HzkBgxjfEUp7GPXB272PVWN065saBmc7s-98DSsdVi6zXm9c6wJcTCdwpscRrkLz1a5v4Xw-gk_ehCa2IW11QVfQrHXQJuH-Z594Co5LXUV3dqhD8PowfZk8Zovn2XwyXmQOS9pmS7bMKS4w49QuqbEFzgXHPCdCcCYKQUqXS0pogYlBJc6XpSio5AwhZnNjSzoEl3-529B8dC62auOjcVWla9d0UaW_OWcpfgguDqCORldl0LXxUW2D3-jwrQQlnHKcsLs_zKWjP70LKhrvauOsD860yjZeYaR28tXOrNqZVVKqvXwl6S9P13hf
CODEN JCRGAE
ContentType Journal Article
Copyright 1988
1989 INIST-CNRS
Copyright_xml – notice: 1988
– notice: 1989 INIST-CNRS
DBID IQODW
8FD
H8D
L7M
DOI 10.1016/0022-0248(88)90124-8
DatabaseName Pascal-Francis
Technology Research Database
Aerospace Database
Advanced Technologies Database with Aerospace
DatabaseTitle Technology Research Database
Aerospace Database
Advanced Technologies Database with Aerospace
DatabaseTitleList
Technology Research Database
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Chemistry
Physics
EISSN 1873-5002
EndPage 575
ExternalDocumentID 7326361
0022024888901248
GroupedDBID --K
--M
-~X
.~1
0R~
1B1
1RT
1~.
1~5
29K
4.4
457
4G.
53G
5GY
5VS
7-5
71M
8P~
9JN
AABNK
AACTN
AAEDT
AAEDW
AAIAV
AAIKJ
AAKOC
AALRI
AAOAW
AAQFI
AAQXK
AAXUO
ABFNM
ABJNI
ABMAC
ABNEU
ABXDB
ABYKQ
ACDAQ
ACFVG
ACGFS
ACIWK
ACNNM
ACRLP
ADBBV
ADEZE
ADIYS
ADMUD
AEBSH
AEKER
AENEX
AFFNX
AFKWA
AFTJW
AGHFR
AGUBO
AGYEJ
AHHHB
AI.
AIEXJ
AIKHN
AITUG
AIVDX
AJBFU
AJOXV
ALMA_UNASSIGNED_HOLDINGS
AMFUW
AMRAJ
ASPBG
AVWKF
AXJTR
AZFZN
BBWZM
BKOJK
BLXMC
CS3
D-I
DU5
EBS
EFJIC
EFLBG
EJD
EO8
EO9
EP2
EP3
F5P
FDB
FEDTE
FGOYB
FIRID
FNPLU
FYGXN
G-2
G-Q
GBLVA
HMV
HVGLF
HZ~
IHE
J1W
KOM
M24
M38
M41
MO0
N9A
NDZJH
O-L
O9-
OAUVE
OGIMB
OZT
P-8
P-9
P2P
PC.
Q38
R2-
RIG
RNS
ROL
RPZ
SDF
SDG
SDP
SES
SEW
SMS
SPC
SPCBC
SPD
SPG
SSQ
SSZ
T5K
TN5
VH1
WUQ
XPP
ZMT
~02
~G-
08R
ABPIF
ABPTK
IQODW
8FD
AKRWK
H8D
L7M
ID FETCH-LOGICAL-e183t-b4b53191463db3cd91576165277647972fe58323912c0f15bf793864004d5cdf3
ISSN 0022-0248
IngestDate Fri Aug 16 00:52:07 EDT 2024
Sun Oct 29 17:09:17 EDT 2023
Fri Feb 23 02:17:09 EST 2024
IsPeerReviewed true
IsScholarly true
Issue 4
Keywords Crystal growth
Semiconductor materials
Crystal orientation
Doping
Czochralski method
X ray topography
Experimental study
Inorganic compound
Dislocation
Gallium Arsenides
Mismatch lattice
Liquid encapsulation
Microstructure
Language English
License CC BY 4.0
LinkModel OpenURL
MergedId FETCHMERGED-LOGICAL-e183t-b4b53191463db3cd91576165277647972fe58323912c0f15bf793864004d5cdf3
Notes ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
PQID 24866446
PQPubID 23500
PageCount 9
ParticipantIDs proquest_miscellaneous_24866446
pascalfrancis_primary_7326361
elsevier_sciencedirect_doi_10_1016_0022_0248_88_90124_8
PublicationCentury 1900
PublicationDate 1988-00-00
PublicationDateYYYYMMDD 1988-01-01
PublicationDate_xml – year: 1988
  text: 1988-00-00
PublicationDecade 1980
PublicationPlace Amsterdam
PublicationPlace_xml – name: Amsterdam
PublicationTitle Journal of crystal growth
PublicationYear 1988
Publisher Elsevier B.V
Elsevier
Publisher_xml – name: Elsevier B.V
– name: Elsevier
References Pichaud, Burle-Durbe, Minari (BIB10) 1985; 71
Kirkpatrick, Chen, Holmes, Asbeck, Elliott, Fairman, Oliver (BIB1) 1983; Vol. 20
Bond (BIB4) 1960; 13
Skolnick, Brozel, Reed, Grant, Stirland, Ware (BIB18) 1984; 13
Barrett, McGuigan, Hobood, Eldridge, Thomas (BIB8) 1984; 70
Martin (BIB5) 1981; 39
Nanishi, Ishida, Honda, Yamazaki, Miyazawa (BIB2) 1982; 21
Holmes, Kuwamoto, Sandberg, Johnston (BIB3) 1988; 91
Kohda, Yamada, Nakanishi, Kobayashi, Osaka, Hoshikawa (BIB11) 1985; 71
Kitano, Matsui, Ishikawa (BIB13) 1985; 24
Nakajima, Katsumata, Terashima, Ishida (BIB9) 1985; 24
Martin, Farges, Jacob, Hallais, Poiblaud (BIB23) 1980; 51
Brozel, Grant, Ware, Stirland (BIB25) 1983; 42
Nakajima, Fujii, Ishida (BIB16) 1987; 84
McGigan, Thomas, Barrett, Eldridge, Messham, Swanson (BIB15) 1986; 76
Jacob, Farges, Schemali, Duseaux, Hallais, Bartels, Roksnoer (BIB21) 1982; 57
Alt, Packeiser (BIB27) 1986; 60
Klapper, Kuppers (BIB22) 1973; A29
Jacob, Duseaux, Farges, van den Boom, Roksnoer (BIB6) 1983; 61
Elliot, Wei, Farrare, Woolhouse, Scott, Hiskes (BIB7) 1983; 70
Yamada, Kohda, Nakanishi, Hoshikawa (BIB14) 1986; 78
Scott, Laderman, Elliot (BIB12) 1985; 47
Grabmaier, Grabmaier (BIB20) 1972; 13/14
Holmes, Chen, Elliot, Kirkpatrick (BIB24) 1982; 40
Holmes, Chen (BIB26) 1984; 55
Ono, Kitano, Matsui (BIB17) 1987; 51
Chen, Holmes (BIB19) 1983; 61
References_xml – volume: 24
  start-page: L948
  year: 1985
  ident: BIB13
  publication-title: Japan. J. Appl. Phys.
  contributor:
    fullname: Ishikawa
– volume: 84
  start-page: 295
  year: 1987
  ident: BIB16
  publication-title: J. Crystal Growth
  contributor:
    fullname: Ishida
– volume: 39
  start-page: 747
  year: 1981
  ident: BIB5
  publication-title: Appl. Phys. Letters
  contributor:
    fullname: Martin
– volume: 57
  start-page: 493
  year: 1982
  ident: BIB21
  publication-title: J. Crystal Growth
  contributor:
    fullname: Roksnoer
– volume: 13/14
  start-page: 635
  year: 1972
  ident: BIB20
  publication-title: J. Crystal Growth
  contributor:
    fullname: Grabmaier
– volume: Vol. 20
  year: 1983
  ident: BIB1
  publication-title: Semiconductors and Semimetals
  contributor:
    fullname: Oliver
– volume: 78
  start-page: 36
  year: 1986
  ident: BIB14
  publication-title: J. Crystal Growth
  contributor:
    fullname: Hoshikawa
– volume: 47
  start-page: 1280
  year: 1985
  ident: BIB12
  publication-title: Appl. Phys. Letters
  contributor:
    fullname: Elliot
– volume: 70
  start-page: 169
  year: 1983
  ident: BIB7
  publication-title: J. Crystal Growth
  contributor:
    fullname: Hiskes
– volume: 71
  start-page: 648
  year: 1985
  ident: BIB10
  publication-title: J. Crystal Growth
  contributor:
    fullname: Minari
– volume: 51
  start-page: 2840
  year: 1980
  ident: BIB23
  publication-title: J. Appl. Phys.
  contributor:
    fullname: Poiblaud
– volume: 70
  start-page: 179
  year: 1984
  ident: BIB8
  publication-title: J. Crystal Growth
  contributor:
    fullname: Thomas
– volume: 61
  start-page: 111
  year: 1983
  ident: BIB19
  publication-title: J. Crystal Growth
  contributor:
    fullname: Holmes
– volume: 55
  start-page: 3588
  year: 1984
  ident: BIB26
  publication-title: J. Appl. Phys.
  contributor:
    fullname: Chen
– volume: A29
  start-page: 495
  year: 1973
  ident: BIB22
  publication-title: Acta Cryst.
  contributor:
    fullname: Kuppers
– volume: 51
  start-page: 238
  year: 1987
  ident: BIB17
  publication-title: Appl. Phys. Letters
  contributor:
    fullname: Matsui
– volume: 40
  start-page: 46
  year: 1982
  ident: BIB24
  publication-title: Appl. Phys. Letters
  contributor:
    fullname: Kirkpatrick
– volume: 21
  start-page: L335
  year: 1982
  ident: BIB2
  publication-title: Japan. J. Appl. Phys.
  contributor:
    fullname: Miyazawa
– volume: 76
  start-page: 217
  year: 1986
  ident: BIB15
  publication-title: J. Crystal Growth
  contributor:
    fullname: Swanson
– volume: 91
  start-page: 557
  year: 1988
  ident: BIB3
  publication-title: J. Crystal Growth
  contributor:
    fullname: Johnston
– volume: 61
  start-page: 417
  year: 1983
  ident: BIB6
  publication-title: J. Crystal Growth
  contributor:
    fullname: Roksnoer
– volume: 42
  start-page: 610
  year: 1983
  ident: BIB25
  publication-title: Appl. Phys. Letters
  contributor:
    fullname: Stirland
– volume: 24
  start-page: L65
  year: 1985
  ident: BIB9
  publication-title: Japan. J. Appl. Phys.
  contributor:
    fullname: Ishida
– volume: 13
  start-page: 814
  year: 1960
  ident: BIB4
  publication-title: Acta Cryst.
  contributor:
    fullname: Bond
– volume: 13
  start-page: 107
  year: 1984
  ident: BIB18
  publication-title: J. Electron. Mater.
  contributor:
    fullname: Ware
– volume: 71
  start-page: 813
  year: 1985
  ident: BIB11
  publication-title: J. Crystal Growth
  contributor:
    fullname: Hoshikawa
– volume: 60
  start-page: 2954
  year: 1986
  ident: BIB27
  publication-title: J. Appl. Phys.
  contributor:
    fullname: Packeiser
SSID ssj0001610
Score 1.3686088
Snippet Extensive microstructural characterization of undoped and isovalent (indium) doped, large diameter, semi-insulating GaAs crystals grown in a low gradient LEC...
SourceID proquest
pascalfrancis
elsevier
SourceType Aggregation Database
Index Database
Publisher
StartPage 567
SubjectTerms Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Methods of crystal growth; physics of crystal growth
Physics
Theory and models of crystal growth; physics of crystal growth, crystal morphology and orientation
Title Dislocation reduction in large-diameter LEC GaAs growth: II. Microstructural characterization
URI https://dx.doi.org/10.1016/0022-0248(88)90124-8
https://search.proquest.com/docview/24866446
Volume 91
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV3Nb9MwFLegO8CEEAwQBQY-cABV3prEsZ1j1XWsrFsllGo9YTX-gEkjm5ZyYH89z3GSpiuIj4tVWdWr9H6_vvdsvw-E3mZMBTYJNUk0pYTaKCOLvtYkYzbpG2oTbtyF_skpO5rRj_N4vpooWFaXLLM9dfPLupL_QRX2AFdXJfsPyDZCYQM-A76wAsKw_hXGB-eF80UlhNeuB2uduXjh8rsJQP_NZbv0JqNh78NiUPS-wKF7-XWvNx67IXUuF8_3jy17b6imd_PNCq7NuFVd_yhcBaWX1Rjs2dngZJpOf1PvcFBVPGhfcCdE21rCQdX1PGtbSz9bq2IFbZm-2I_VqLxo7OehbBhof1fQSIYoWsDiHudCSsTKKdUP8adTeTibTGQ6mqd30VbI4TzXQVuD409nx43Hhai1X3eFd1LrEsmA7Td774R4X_3KWtzx4GpRwL_B-jEmGx65DDPSR-hhpWc88GA_RndMvoPuDeuxfDtou9VB8gn63KIAbiiAz3O8TgEMFMCOAriiAB6PMcG3KIBvU-Apmh2O0uERqUZmEAO2eUkymjmjCu4v0lmkdBLAeTJgccg5ozzhoTUx2PAoCULVt0GcWbDPgjlDrmOlbfQMdfLL3DxHmFkdGa6YTgzE1EwJFRrBDdeR1UawuIt4rUVZRWs-CpOAtayTB53-pdO_FEKW-peii3bXlC6vfGMVyeEsEbGgi97UIEhQrnvBWuTm8nshQQ6DAJ69-OM3XqL7jsz-suwV6oAmzS6Ej8vsdcWen1mLbxY
link.rule.ids 315,786,790,4043,27956,27957,27958
linkProvider Library Specific Holdings
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Dislocation+reduction+in+large-diameter+LEC+GaAs+growth.+II+-+Microstructural+characterization&rft.jtitle=Journal+of+crystal+growth&rft.au=KUWAMOTO%2C+H&rft.au=Holmes%2C+D+E&rft.date=1988&rft.issn=0022-0248&rft.volume=91&rft.issue=4&rft.spage=567&rft.epage=575&rft_id=info:doi/10.1016%2F0022-0248%2888%2990124-8&rft.externalDBID=NO_FULL_TEXT
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0022-0248&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0022-0248&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0022-0248&client=summon