Sumiya, M., Sumita, M., Tsuda, Y., Sakamoto, T., Sang, L., Harada, Y., & Yoshigoe, A. (2022). High reactivity of H2O vapor on GaN surfaces. Science and technology of advanced materials, 23(1), 189-198. https://doi.org/10.1080/14686996.2022.2052180
Chicago Style (17th ed.) CitationSumiya, Masatomo, Masato Sumita, Yasutaka Tsuda, Tetsuya Sakamoto, Liwen Sang, Yoshitomo Harada, and Akitaka Yoshigoe. "High Reactivity of H2O Vapor on GaN Surfaces." Science and Technology of Advanced Materials 23, no. 1 (2022): 189-198. https://doi.org/10.1080/14686996.2022.2052180.
MLA (9th ed.) CitationSumiya, Masatomo, et al. "High Reactivity of H2O Vapor on GaN Surfaces." Science and Technology of Advanced Materials, vol. 23, no. 1, 2022, pp. 189-198, https://doi.org/10.1080/14686996.2022.2052180.