Precision Control of Amphoteric Doping in CuxBi2Se3 Nanoplates
Copper-doped Bi 2 Se 3 (Cu x Bi 2 Se 3 ) is of considerable interest for tailoring its electronic properties and inducing exotic charge correlations while retaining the unique Dirac surface states. However, the copper dopants in Cu x Bi 2 Se 3 display complex electronic behaviors and may function as...
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Published in | Precision Chemistry Vol. 2; no. 8; pp. 421 - 427 |
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Main Authors | , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
University of Science and Technology of China and American Chemical Society
26.08.2024
American Chemical Society |
Online Access | Get full text |
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Summary: | Copper-doped Bi
2
Se
3
(Cu
x
Bi
2
Se
3
) is of considerable
interest for
tailoring its electronic properties and inducing exotic charge correlations
while retaining the unique Dirac surface states. However, the copper
dopants in Cu
x
Bi
2
Se
3
display complex electronic behaviors and may function as either
electron donors or acceptors depending on their concentration and
atomic sites within the Bi
2
Se
3
crystal lattice.
Thus, a precise understanding and control of the doping concentration
and sites is of both fundamental and practical significance. Herein,
we report a solution-based one-pot synthesis of Cu
x
Bi
2
Se
3
nanoplates with systematically
tunable Cu doping concentrations and doping sites. Our studies reveal
a gradual evolution from intercalative sites to substitutional sites
with increasing Cu concentrations. The Cu atoms at intercalative sites
function as electron donors while those at the substitutional sites
function as electron acceptors, producing distinct effects on the
electronic properties of the resulting materials. We further show
that Cu
0.18
Bi
2
Se
3
exhibits superconducting
behavior, which is not present in Bi
2
Se
3
, highlighting
the essential role of Cu doping in tailoring exotic quantum properties.
This study establishes an efficient methodology for precise synthesis
of Cu
x
Bi
2
Se
3
with
tailored doping concentrations, doping sites, and electronic properties. |
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ISSN: | 2771-9316 |
DOI: | 10.1021/prechem.4c00046 |