Sub-wavelength Lithography and Variability Aware SRAM Characterization

• Published in: Radioengineering Vol. 21; no. 1; pp. 219 - 224
• Main Authors: P. Dobrovolny, M. Miranda, P. Zuber
• Format: Journal Article
• Language: English
• Published: Spolecnost pro radioelektronicke inzenyrstvi 01.04.2012
• Subjects: Litho process and technology variability; statistical SRAM analysis; yield prediction

With shrinking of minimum feature size of advanced technology nodes, the impact of litho process variations on the resulting electrical parameters of printed circuits dramatically increases. Litho process variations correspond to random changes in the actual optical conditions (dose and focus) which...