1-丁基-3-甲基咪唑醋酸盐和水混合电解液中三价铬电沉积铬的研究

本文在[BMIM]OAc-H2O电解液中研究了Cr3＋的电沉积反应．经循环伏安研究表明，Cr3＋的还原属于受扩散控制的分步还原过程，即Cr3＋e→Cr2＋和Cr2＋＋2e→Cr^0在40℃下通过Rendle．Sevcik方程计算得到Cr3＋的扩散系数为1．2×10^-8cm·S-1．采用计时电流法探讨了Cr的三维瞬时成核机理．对沉积的铬镀层进行了XRD和SEM表征，结果表明，经600℃氩气保护下煅烧后的镀层由Cr和Cr2O3，纳米球状颗粒聚集而成，其平均粒径为0．48μm．对40℃、-3．0V条件下所得镀层进行EDX检测，发现Cr与0的能级峰十分明显，其中Cr的质量分数为83．8％．通过在[B...

Full description

Saved in:
Bibliographic Details
Published in电化学 Vol. 23; no. 3; pp. 332 - 339
Main Author 罗维 钮东方 杜荣斌 王钧伟 汪竹青 徐衡 张新胜
Format Journal Article
LanguageChinese
Published 2017
Subjects
1-丁基-3-甲基咪唑乙酸盐
三价铬
电沉积
铬镀层
Online AccessGet full text

Cover

More Information
Summary:本文在[BMIM]OAc-H2O电解液中研究了Cr3＋的电沉积反应．经循环伏安研究表明，Cr3＋的还原属于受扩散控制的分步还原过程，即Cr3＋e→Cr2＋和Cr2＋＋2e→Cr^0在40℃下通过Rendle．Sevcik方程计算得到Cr3＋的扩散系数为1．2×10^-8cm·S-1．采用计时电流法探讨了Cr的三维瞬时成核机理．对沉积的铬镀层进行了XRD和SEM表征，结果表明，经600℃氩气保护下煅烧后的镀层由Cr和Cr2O3，纳米球状颗粒聚集而成，其平均粒径为0．48μm．对40℃、-3．0V条件下所得镀层进行EDX检测，发现Cr与0的能级峰十分明显，其中Cr的质量分数为83．8％．通过在[BMIM]OAc、[BMIMIBF4和[BMIM]PF。三种离子液体体系中电镀得到的Cr镀层质量的比较，表明OAc-的确有利于Cr的电沉积．
Bibliography:electrodeposition; 1-butyl-3-methylimidazolium acetate; Wivalent chromium ion; Cr coating
The electrochemical reduction of trivalent chromium ion （Cr3＋） to Cr in 1-butyl-3-methylimidazolium acetate （[BMIM]OAc）-H2O mixed electrolyte was investigated. The cyclic voltammograms showed that the electroreduction of Cr3＋ in the mixed electrolyte occurred in a two-step process, namely, Cr3＋ ＋ e → Cr2＋ and Cr2＋ ＋ 2e→ Cr^0, controlled by the diffusion of Cr3＋ to the electrode. The diffusion coefficient of Cr3＋ was 1.2 ×10^-8 cm2· s-1 at 40 ℃obtained by Rendle-Sevcik equation. The chronoamperomograms of the Cr3＋ electrodeposition confirmed the three-dimensional instantaneous nucleation mechanism of Cr. The XRD and SEM characterizations on the Cr coating after calcining in argon atmosphere at 600℃ revealed that the coating was composed of Cr and chromium oxide （Cr2O3） nanoparticles with an average particle size of 0.48 μm. The elements of Cr and O were obviously detected from the coating obtained at 40 ℃ and -3.0 V by EDX
ISSN:1006-3471
2993-074X
DOI:10.13208/j.electrochem.161053