Low Thermal Budget Fabrication and Performance Comparison of MFM Capacitors With Thermal and Plasma-Enhanced Atomic Layer Deposited Hf 0.45 Zr 0.55 O x Ferroelectrics

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Published inIEEE transactions on electron devices Vol. 68; no. 12; pp. 6359 - 6364
Main Authors Xiao, Dong-Qi, Luo, Bin-Bin, Xiong, Wen, Wu, Xiaohan, Zhang, David Wei, Ding, Shi-Jin
Format Journal Article
LanguageEnglish
Published 01.12.2021
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Author Xiao, Dong-Qi
Luo, Bin-Bin
Xiong, Wen
Wu, Xiaohan
Zhang, David Wei
Ding, Shi-Jin
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crossref_primary_10_1021_acsami_4c01234
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Title Low Thermal Budget Fabrication and Performance Comparison of MFM Capacitors With Thermal and Plasma-Enhanced Atomic Layer Deposited Hf 0.45 Zr 0.55 O x Ferroelectrics
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