High resolution secondary ion mass spectrometry analysis of hydrogen behavior in SiO 2 /SiN/SiO 2 films with thermal treatment

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 53; no. 8S1; p. 8
Main Authors Sakurai, Yusuke, Kunimune, Yorinobu, Inoue, Masao, Maruyama, Yoshiki, Nishida, Akio, Ide, Takashi
Format Journal Article
LanguageEnglish
Published 01.08.2014
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ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.53.08LC03