Electrical and Optical Characterization of GeON Layers with high-k Gate Stacks on Germanium for Future MOSFETs

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Bibliographic Details
Published inMeeting abstracts (Electrochemical Society) Vol. MA2012-01; no. 16; p. 690
Main Authors Murad, Shahjahan N., Baine, Paul T., Montgomery, John H., McNeill, David W., Mitchell, S.J.N., Armstrong, B.M., Modreanu, Mircea
Format Journal Article
LanguageEnglish
Published 15.02.2012
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ISSN:2151-2043
2151-2035
DOI:10.1149/MA2012-01/16/690