Ultrafast Carrier Relaxation Dynamics in a Nodal-Line Semimetal PtSn 4

• Published in: Nano letters Vol. 24; no. 21; pp. 6278 - 6285
• Main Authors: Lin, Tianyun, Ju, Yongkang, Zhong, Haoyuan, Zeng, Xiangyu, Dong, Xue, Bao, Changhua, Zhang, Hongyun, Xia, Tian-Long, Tang, Peizhe, Zhou, Shuyun
• Format: Journal Article
• Language: English
• Published: United States 29.05.2024
• Subjects: Dirac nodal-line semimetal; ultrafast relaxation process; time-resolved ARPES

Topological Dirac nodal-line semimetals host topologically nontrivial electronic structure with nodal-line crossings around the Fermi level, which could affect the photocarrier dynamics and lead to novel relaxation mechanisms. Herein, by using time- and angle-resolved photoemission spectroscopy, we...