高美珍, 杨. (2016). 利用椭偏仪研究氢气退火处理对ZnO-Ga薄膜光学性能的影响. 红外与毫米波学报, 35(1), 6-10. https://doi.org/10.11972/j.issn.1001-9014.2016.01.002
Chicago Style (17th ed.) Citation高美珍, 杨娇. "利用椭偏仪研究氢气退火处理对ZnO-Ga薄膜光学性能的影响." 红外与毫米波学报 35, no. 1 (2016): 6-10. https://doi.org/10.11972/j.issn.1001-9014.2016.01.002.
MLA (9th ed.) Citation高美珍, 杨娇. "利用椭偏仪研究氢气退火处理对ZnO-Ga薄膜光学性能的影响." 红外与毫米波学报, vol. 35, no. 1, 2016, pp. 6-10, https://doi.org/10.11972/j.issn.1001-9014.2016.01.002.
Warning: These citations may not always be 100% accurate.