Orthogonal Processing: A Novel Photolithographic Patterning Method for Organic Electronics

Organic electronics is an extensively studied subject opening new horizons in electronics technology. It has attracted great attention as a technology to enable flexible electronic devices through solution processing of organic and polymeric materials. However, patterning of organic materials to con...

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Published inJournal of Photopolymer Science and Technology Vol. 22; no. 5; pp. 565 - 569
Main Authors Fong, Hon Hang, Lee, Jin-Kyun, Malliaras, George G., Hwang, Ha Soo, Zakhidov, Alexander A., Taylor, Priscillia G., Ober, Christopher K., Chatzichristidi, Margarita
Format Journal Article
LanguageEnglish
Published The Society of Photopolymer Science and Technology(SPST) 01.01.2009
Subjects
Carbon dioxide
Devices
Electronics
Hafnium
hydrofluoroethers
lift-off patterning
organic electronics
Organic materials
Patterning
Photolithography
Solvents
supercritical carbon dioxide
Online AccessGet full text
ISSN0914-9244
1349-6336
1349-6336
DOI10.2494/photopolymer.22.565

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Abstract Organic electronics is an extensively studied subject opening new horizons in electronics technology. It has attracted great attention as a technology to enable flexible electronic devices through solution processing of organic and polymeric materials. However, patterning of organic materials to construct device components still remains one of the major hurdles to be overcome due to problems with chemical processing. Fundamentally this challenge originates from the limited number of options regarding orthogonal solvents. Recently, we have identified supercritical carbon dioxide (scCO2) and segregated hydrofluoroethers (HFEs) as universal, non-damaging solvents for most non-fluorinated polymeric materials. These unconventional solvents expand processing options from the two-dimensional plane to three-dimensional space by drawing another orthogonal axis. Taking advantage of those noble solvents and fluorinated photoresists, we were able to make patterns of functional organic materials photolithographically. Furthermore, our orthogonal processing method has been applied to the fabrication of a patterned polymer light-emitting device in scCO2 and an organic thin-film transisotor in HFEs.
AbstractList Organic electronics is an extensively studied subject opening new horizons in electronics technology. It has attracted great attention as a technology to enable flexible electronic devices through solution processing of organic and polymeric materials. However, patterning of organic materials to construct device components still remains one of the major hurdles to be overcome due to problems with chemical processing. Fundamentally this challenge originates from the limited number of options regarding orthogonal solvents. Recently, we have identified supercritical carbon dioxide (scCO sub(2)) and segregated hydrofluoroethers (HFEs) as universal, non-damaging solvents for most non-fluorinated polymeric materials. These unconventional solvents expand processing options from the two-dimensional plane to three-dimensional space by drawing another orthogonal axis. Taking advantage of those noble solvents and fluorinated photoresists, we were able to make patterns of functional organic materials photolithographically. Furthermore, our orthogonal processing method has been applied to the fabrication of a patterned polymer light-emitting device in scCO sub(2) and an organic thin-film transisotor in HFEs.
Organic electronics is an extensively studied subject opening new horizons in electronics technology. It has attracted great attention as a technology to enable flexible electronic devices through solution processing of organic and polymeric materials. However, patterning of organic materials to construct device components still remains one of the major hurdles to be overcome due to problems with chemical processing. Fundamentally this challenge originates from the limited number of options regarding orthogonal solvents. Recently, we have identified supercritical carbon dioxide (scCO2) and segregated hydrofluoroethers (HFEs) as universal, non-damaging solvents for most non-fluorinated polymeric materials. These unconventional solvents expand processing options from the two-dimensional plane to three-dimensional space by drawing another orthogonal axis. Taking advantage of those noble solvents and fluorinated photoresists, we were able to make patterns of functional organic materials photolithographically. Furthermore, our orthogonal processing method has been applied to the fabrication of a patterned polymer light-emitting device in scCO2 and an organic thin-film transisotor in HFEs.
Author Hwang, Ha Soo
Zakhidov, Alexander A.
Ober, Christopher K.
Chatzichristidi, Margarita
Lee, Jin-Kyun
Taylor, Priscillia G.
Fong, Hon Hang
Malliaras, George G.
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SubjectTerms Carbon dioxide
Devices
Electronics
Hafnium
hydrofluoroethers
lift-off patterning
organic electronics
Organic materials
Patterning
Photolithography
Solvents
supercritical carbon dioxide
Title Orthogonal Processing: A Novel Photolithographic Patterning Method for Organic Electronics
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