Photochemical Studies on Bottom Anti-Reflective Coatings

• Published in: Journal of Photopolymer Science and Technology Vol. 19; no. 3; pp. 343 - 347
• Main Authors: Guerrero, Douglas J., Mercado, Ramil, Washburn, Carlton, Meador, Jim
• Format: Journal Article
• Language: English
• Published: Hiratsuka The Society of Photopolymer Science and Technology(SPST) 01.01.2006; Japan Science and Technology Agency
• Subjects: BARC; Coatings; Diffusion; Lithography; Optimization; PEB; Photochemical; Photoresists; photosensitive; Reflectivity; Silicon substrates; wet developable

The photochemical behavior of 193-nm photosensitive bottom anti-reflective coatings (BARCs) were studied. The effects of exposure dose, post-exposure bake (PEB) temperature, PAG size, and BARC thickness on contrast and the decrosslinking process was investigated. Using higher PEB temperatures improv...