Moving-mask Lithography for 3D Microstructure Molding

Backside lithography with a moving mask UV exposure technique is proposed. A novel moving-mask exposure apparatus was developed and evaluated both experimentally and through exposure simulations. The backside exposure using this technique was validated and is capable of producing tapered microstruct...

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Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 27; no. 1; pp. 85 - 89
Main Authors Kato, Nobuhiro, Kai, Takahisa, Hirano, Masakazu
Format Journal Article
LanguageEnglish
Published Hiratsuka The Society of Photopolymer Science and Technology(SPST) 01.01.2014
Japan Science and Technology Agency
Subjects
backside exposure
Exposure
Lithography
Masks
Microstructure
molding
moving mask exposure
Photopolymers
Photoresists
Simulation
Three dimensional
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Summary:Backside lithography with a moving mask UV exposure technique is proposed. A novel moving-mask exposure apparatus was developed and evaluated both experimentally and through exposure simulations. The backside exposure using this technique was validated and is capable of producing tapered microstructures of thick photoresist for molding. The shape of the structure can be modified by the trajectory of the stage movement. It was confirmed that the shape of the processed structure could be successfully predicted using the proposed simulation method.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.27.85