Recent Progress of Photosensitive Polyimides

• Published in: Polymer journal Vol. 40; no. 4; pp. 281 - 296
• Main Authors: Fukukawa, Ken-ichi, Ueda, Mitsuru
• Format: Journal Article
• Language: English
• Published: London Nature Publishing Group UK 01.01.2008; Society of Polymer Science; Nature Publishing Group
• Subjects: Applied sciences; Biomaterials; Bioorganic Chemistry; Chemistry; Chemistry and Materials Science; Chemistry/Food Science; Exact sciences and technology; Physicochemistry of polymers; Polymer Sciences; Polymers and radiations; Properties and characterization; review-article; Surfaces and Interfaces; Thin Films; Low Temperature Imidization; Photobase Generator; Photoacid Generator; Photosensitive Polyimide; Diazonaphthoquinone; Photochemical Amplification; Photosensitive Compound; Poly(amic acid); Polyimide; State of the art; Low Temperature hnidization; Chemically amplified resist; Photolithography; Photoresist

Photosensitive polyimides (PSPIs) have been attracting great attention as insulating materials in microelectronic industry, and can be directly patterned to simplify processing steps. This article reviews recent works on development of PSPIs. After brief introduction, a typical PSPI formulation was...