Low defect and high electrical conductivity of graphene through plasma graphene healing treatment monitored with in situ optical emission spectroscopy
Fundamental studies on graphene (Gr) and its real device applications have been affected by unavoidable defects and impurities which are usually present in synthesized Gr. Therefore, post treatment methods on Gr have been an important subject of research followed by the community. Here, we demonstra...
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Published in | Scientific reports Vol. 11; no. 1; pp. 20334 - 6 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
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Nature Publishing Group UK
13.10.2021
Nature Publishing Group Nature Portfolio |
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Abstract | Fundamental studies on graphene (Gr) and its real device applications have been affected by unavoidable defects and impurities which are usually present in synthesized Gr. Therefore, post treatment methods on Gr have been an important subject of research followed by the community. Here, we demonstrate a post-treatment of cm-sized CVD-grown graphene in a Radio Frequency-generated low-pressure plasma of methane and hydrogen to remove oxygen functional groups and heal the structural defects. The optimum plasma treatment parameters, such as pressure, plasma power, and the ratio of the gases, are optimized using in-situ optical emission spectroscopy. This way we present an optimal healing condition monitored with in situ OES. A twofold increase in the conductivity of plasma-treated Gr samples was obtained. Plasma treatment conditions give insights into the possible underlying mechanisms, and the method presents an effective way to obtain improved Gr quality. |
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AbstractList | Abstract Fundamental studies on graphene (Gr) and its real device applications have been affected by unavoidable defects and impurities which are usually present in synthesized Gr. Therefore, post treatment methods on Gr have been an important subject of research followed by the community. Here, we demonstrate a post-treatment of cm-sized CVD-grown graphene in a Radio Frequency-generated low-pressure plasma of methane and hydrogen to remove oxygen functional groups and heal the structural defects. The optimum plasma treatment parameters, such as pressure, plasma power, and the ratio of the gases, are optimized using in-situ optical emission spectroscopy. This way we present an optimal healing condition monitored with in situ OES. A twofold increase in the conductivity of plasma-treated Gr samples was obtained. Plasma treatment conditions give insights into the possible underlying mechanisms, and the method presents an effective way to obtain improved Gr quality. Fundamental studies on graphene (Gr) and its real device applications have been affected by unavoidable defects and impurities which are usually present in synthesized Gr. Therefore, post treatment methods on Gr have been an important subject of research followed by the community. Here, we demonstrate a post-treatment of cm-sized CVD-grown graphene in a Radio Frequency-generated low-pressure plasma of methane and hydrogen to remove oxygen functional groups and heal the structural defects. The optimum plasma treatment parameters, such as pressure, plasma power, and the ratio of the gases, are optimized using in-situ optical emission spectroscopy. This way we present an optimal healing condition monitored with in situ OES. A twofold increase in the conductivity of plasma-treated Gr samples was obtained. Plasma treatment conditions give insights into the possible underlying mechanisms, and the method presents an effective way to obtain improved Gr quality. Fundamental studies on graphene (Gr) and its real device applications have been affected by unavoidable defects and impurities which are usually present in synthesized Gr. Therefore, post treatment methods on Gr have been an important subject of research followed by the community. Here, we demonstrate a post-treatment of cm-sized CVD-grown graphene in a Radio Frequency-generated low-pressure plasma of methane and hydrogen to remove oxygen functional groups and heal the structural defects. The optimum plasma treatment parameters, such as pressure, plasma power, and the ratio of the gases, are optimized using in-situ optical emission spectroscopy. This way we present an optimal healing condition monitored with in situ OES. A twofold increase in the conductivity of plasma-treated Gr samples was obtained. Plasma treatment conditions give insights into the possible underlying mechanisms, and the method presents an effective way to obtain improved Gr quality.Fundamental studies on graphene (Gr) and its real device applications have been affected by unavoidable defects and impurities which are usually present in synthesized Gr. Therefore, post treatment methods on Gr have been an important subject of research followed by the community. Here, we demonstrate a post-treatment of cm-sized CVD-grown graphene in a Radio Frequency-generated low-pressure plasma of methane and hydrogen to remove oxygen functional groups and heal the structural defects. The optimum plasma treatment parameters, such as pressure, plasma power, and the ratio of the gases, are optimized using in-situ optical emission spectroscopy. This way we present an optimal healing condition monitored with in situ OES. A twofold increase in the conductivity of plasma-treated Gr samples was obtained. Plasma treatment conditions give insights into the possible underlying mechanisms, and the method presents an effective way to obtain improved Gr quality. |
ArticleNumber | 20334 |
Author | Mohseni, Seyed Majid Shokri, Babak Salehi, Mohammad Bastani, Parnia Madani, Abbas Jamilpanah, Loghman |
Author_xml | – sequence: 1 givenname: Mohammad surname: Salehi fullname: Salehi, Mohammad organization: Laser and Plasma Research Institute, Shahid Beheshti University – sequence: 2 givenname: Parnia surname: Bastani fullname: Bastani, Parnia organization: Department of Physics, Shahid Beheshti University – sequence: 3 givenname: Loghman surname: Jamilpanah fullname: Jamilpanah, Loghman organization: Department of Physics, Shahid Beheshti University – sequence: 4 givenname: Abbas surname: Madani fullname: Madani, Abbas organization: AMO GmbH (Advanced Microelectronic Center), Department of Engineering, The University of Cambridge – sequence: 5 givenname: Seyed Majid surname: Mohseni fullname: Mohseni, Seyed Majid email: m-mohseni@sbu.ac.ir organization: Department of Physics, Shahid Beheshti University – sequence: 6 givenname: Babak surname: Shokri fullname: Shokri, Babak email: b-shokri@sbu.ac.ir organization: Laser and Plasma Research Institute, Shahid Beheshti University, Department of Physics, Shahid Beheshti University |
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Snippet | Fundamental studies on graphene (Gr) and its real device applications have been affected by unavoidable defects and impurities which are usually present in... Abstract Fundamental studies on graphene (Gr) and its real device applications have been affected by unavoidable defects and impurities which are usually... |
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SubjectTerms | 639/301 639/925 Electrical conductivity Emission spectroscopy Graphene Humanities and Social Sciences Impurities multidisciplinary Plasma Science Science (multidisciplinary) Spectroscopy Spectrum analysis |
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Title | Low defect and high electrical conductivity of graphene through plasma graphene healing treatment monitored with in situ optical emission spectroscopy |
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