Rapid, noncontact, sensitive, and semiquantitative characterization of buffered hydrogen-fluoride-treated silicon wafer surfaces by terahertz emission spectroscopy

• Published in: Light, science & applications Vol. 11; no. 1; pp. 334 - 12
• Main Authors: Yang, Dongxun, Mannan, Abdul, Murakami, Fumikazu, Tonouchi, Masayoshi
• Format: Journal Article
• Language: English
• Published: London Nature Publishing Group UK 25.11.2022; Springer Nature B.V; Nature Publishing Group
• Subjects: 639/624/1107/510; 639/624/1107/527; Contamination; Hydrogen fluoride; Integrated circuits; Laser radiation; Lasers; Microwaves; Optical and Electronic Materials; Optical Devices; Optics; Photonics; Physics; Physics and Astronomy; RF and Optical Engineering; Silicon wafers; Spectroscopy; Spectrum analysis; Surface properties

Advances in modern semiconductor integrated circuits have always demanded faster and more sensitive analytical methods on a large-scale wafer. The surface of wafers is fundamentally essential to start building circuits, and quantitative measures of the surface potential, defects, contamination, pass...