Room-temperature InP distributed feedback laser array directly grown on silicon

Fully exploiting the silicon photonics platform for large-volume, cost-sensitive applications requires a fundamentally new approach to directly integrate high-performance laser sources using wafer-scale fabrication methods. Direct-bandgap III–V semiconductors allow efficient light generation, but th...

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Published inNature photonics Vol. 9; no. 12; pp. 837 - 842
Main Authors Wang, Zhechao, Tian, Bin, Pantouvaki, Marianna, Guo, Weiming, Absil, Philippe, Van Campenhout, Joris, Merckling, Clement, Van Thourhout, Dries
Format Journal Article
LanguageEnglish
Published London Nature Publishing Group UK 01.12.2015
Nature Publishing Group
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Summary:Fully exploiting the silicon photonics platform for large-volume, cost-sensitive applications requires a fundamentally new approach to directly integrate high-performance laser sources using wafer-scale fabrication methods. Direct-bandgap III–V semiconductors allow efficient light generation, but the large mismatch in lattice constant, thermal expansion and crystal polarity makes their epitaxial growth directly on silicon extremely complex. Using a selective-area growth technique in confined regions, we surpass this fundamental limit and demonstrate an optically pumped InP-based distributed feedback laser array monolithically grown on (001)-silicon operating at room temperature and suitable for wavelength-division-multiplexing applications. The novel epitaxial technology suppresses threading dislocations and anti-phase boundaries to a less than 20-nm-thick layer, which does not affect device performance. Using an in-plane laser cavity defined using standard top-down lithographic patterning together with a high yield and high uniformity provides scalability and a straightforward path towards cost-effective co-integration with silicon photonic and electronic circuits. Scientists demonstrate an optically pumped InP-based distributed feedback laser array monolithically grown on (001)-silicon operating at room temperature that is suitable for wavelength-division multiplexing applications.
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ISSN:1749-4885
1749-4893
DOI:10.1038/nphoton.2015.199