Novel Method for Electroless Etching of 6H-SiC

In this article, we report an electroless method to fabricate porous hexagonal silicon carbide and hexagonal silicon carbide nanoparticles (NPs) as small as 1 nm using wet chemical stain etching. We observe quantum confinement effect for ultrasmall hexagonal SiC NPs in contrast to the cubic SiC NPs....

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Published inNanomaterials (Basel, Switzerland) Vol. 10; no. 3; p. 538
Main Authors Károlyházy, Gyula, Beke, Dávid, Zalka, Dóra, Lenk, Sándor, Krafcsik, Olga, Kamarás, Katalin, Gali, Ádám
Format Journal Article
LanguageEnglish
Published Switzerland MDPI 17.03.2020
MDPI AG
Subjects
chemical etching
nanoparticles
photoluminescence spectroscopy
silicon carbide
x-ray photoemission spectroscopy
chemical etching
X-ray photoemission spectroscopy
nanoparticles
photoluminescence spectroscopy
silicon carbide
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Summary:In this article, we report an electroless method to fabricate porous hexagonal silicon carbide and hexagonal silicon carbide nanoparticles (NPs) as small as 1 nm using wet chemical stain etching. We observe quantum confinement effect for ultrasmall hexagonal SiC NPs in contrast to the cubic SiC NPs. We attribute this difference to the various surface terminations of the two polytypes of SiC NPs.
Bibliography:ObjectType-Article-1
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ISSN:2079-4991
2079-4991
DOI:10.3390/nano10030538